JPS5728333A - Method for detecting aligning mark - Google Patents

Method for detecting aligning mark

Info

Publication number
JPS5728333A
JPS5728333A JP10412280A JP10412280A JPS5728333A JP S5728333 A JPS5728333 A JP S5728333A JP 10412280 A JP10412280 A JP 10412280A JP 10412280 A JP10412280 A JP 10412280A JP S5728333 A JPS5728333 A JP S5728333A
Authority
JP
Japan
Prior art keywords
mark
detection
width
aligning
aligning mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10412280A
Other languages
Japanese (ja)
Other versions
JPH0147892B2 (en
Inventor
Takayuki Miyazaki
Toshihiko Osada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10412280A priority Critical patent/JPS5728333A/en
Publication of JPS5728333A publication Critical patent/JPS5728333A/en
Publication of JPH0147892B2 publication Critical patent/JPH0147892B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Abstract

PURPOSE:To enable easy and fast detection of an aligning mark by a method wherein a single aligning mark is formed in advance on an adequate portion of a wafer, and the size of which is measured by beam scanning to be settled as a standard thereafter. CONSTITUTION:A mark MD of the same shape and size with an aligning mark MK is provided on circumference of a wafer for detecting marks. First, a mark MD is detected and the mark width MW is read. A CPU detects in the first detection a maximum value L1, and as for the second detection it is peformed only regarding a portion set apart from L1 by the mark width MW. Said method will permit detection of a minimum value S1 to be easier and faster as well as the analysis time of the CPU to be shortened. Also since the second detection is performed only for a portion set apart from the maximum value by MW, the minimum values S0 and S2 are not detected within the width MW. Accordingly, pattern P1 and P2 are prevented from being mistaken for the mark MK, patterns can be formed as near as the MK, and the degree of integration improves.
JP10412280A 1980-07-29 1980-07-29 Method for detecting aligning mark Granted JPS5728333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10412280A JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10412280A JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Publications (2)

Publication Number Publication Date
JPS5728333A true JPS5728333A (en) 1982-02-16
JPH0147892B2 JPH0147892B2 (en) 1989-10-17

Family

ID=14372312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10412280A Granted JPS5728333A (en) 1980-07-29 1980-07-29 Method for detecting aligning mark

Country Status (1)

Country Link
JP (1) JPS5728333A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask
JP2007136260A (en) * 2005-11-14 2007-06-07 Okamura Corp Shredder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04297016A (en) * 1991-03-26 1992-10-21 Soltec:Kk Preparing method of x-ray mask
JP2007136260A (en) * 2005-11-14 2007-06-07 Okamura Corp Shredder

Also Published As

Publication number Publication date
JPH0147892B2 (en) 1989-10-17

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