JPS56125836A - Method for electron beam exposure - Google Patents

Method for electron beam exposure

Info

Publication number
JPS56125836A
JPS56125836A JP2998380A JP2998380A JPS56125836A JP S56125836 A JPS56125836 A JP S56125836A JP 2998380 A JP2998380 A JP 2998380A JP 2998380 A JP2998380 A JP 2998380A JP S56125836 A JPS56125836 A JP S56125836A
Authority
JP
Japan
Prior art keywords
electron beam
mark
ion beam
exposure
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2998380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6232612B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2998380A priority Critical patent/JPS56125836A/ja
Publication of JPS56125836A publication Critical patent/JPS56125836A/ja
Publication of JPS6232612B2 publication Critical patent/JPS6232612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP2998380A 1980-03-10 1980-03-10 Method for electron beam exposure Granted JPS56125836A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2998380A JPS56125836A (en) 1980-03-10 1980-03-10 Method for electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2998380A JPS56125836A (en) 1980-03-10 1980-03-10 Method for electron beam exposure

Publications (2)

Publication Number Publication Date
JPS56125836A true JPS56125836A (en) 1981-10-02
JPS6232612B2 JPS6232612B2 (enrdf_load_stackoverflow) 1987-07-15

Family

ID=12291188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2998380A Granted JPS56125836A (en) 1980-03-10 1980-03-10 Method for electron beam exposure

Country Status (1)

Country Link
JP (1) JPS56125836A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6232612B2 (enrdf_load_stackoverflow) 1987-07-15

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