JPS5754320A - Denshibiimurokohoho - Google Patents

Denshibiimurokohoho

Info

Publication number
JPS5754320A
JPS5754320A JP13014780A JP13014780A JPS5754320A JP S5754320 A JPS5754320 A JP S5754320A JP 13014780 A JP13014780 A JP 13014780A JP 13014780 A JP13014780 A JP 13014780A JP S5754320 A JPS5754320 A JP S5754320A
Authority
JP
Japan
Prior art keywords
electron
recessed part
reflected
electron beam
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13014780A
Other languages
English (en)
Inventor
Takayuki Miyazaki
Haruo Tsuchikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13014780A priority Critical patent/JPS5754320A/ja
Publication of JPS5754320A publication Critical patent/JPS5754320A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP13014780A 1980-09-19 1980-09-19 Denshibiimurokohoho Pending JPS5754320A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13014780A JPS5754320A (ja) 1980-09-19 1980-09-19 Denshibiimurokohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13014780A JPS5754320A (ja) 1980-09-19 1980-09-19 Denshibiimurokohoho

Publications (1)

Publication Number Publication Date
JPS5754320A true JPS5754320A (ja) 1982-03-31

Family

ID=15027090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13014780A Pending JPS5754320A (ja) 1980-09-19 1980-09-19 Denshibiimurokohoho

Country Status (1)

Country Link
JP (1) JPS5754320A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5336895A (en) * 1991-06-17 1994-08-09 Sharp Kabushiki Kaisha Impurity free reference grid for use charged partiole beam spectroscopes
JPH076460A (ja) * 1993-12-16 1995-01-10 Sanyo Electric Co Ltd ビデオテープレコーダのテープ保護装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5336895A (en) * 1991-06-17 1994-08-09 Sharp Kabushiki Kaisha Impurity free reference grid for use charged partiole beam spectroscopes
JPH076460A (ja) * 1993-12-16 1995-01-10 Sanyo Electric Co Ltd ビデオテープレコーダのテープ保護装置

Similar Documents

Publication Publication Date Title
JPS55150225A (en) Method of correcting white spot fault of photomask
JPS5694630A (en) Etching method using ion-beam
JPS5754320A (ja) Denshibiimurokohoho
JPS52119172A (en) Forming method of fine pattern
JPS5492061A (en) Micropattern forming method
JPS5534430A (en) Positioning method in electron beam exposure
JPS5742130A (en) Forming method for minute pattern
JPS5724038A (en) Information recording member
JPS5251874A (en) Electron beam exposure device
JPS53147465A (en) Forming method of patterns for lift-off
JPS56107555A (en) Detection of position of electron beam
JPS56125833A (en) Exposing method for electron beam
JPS56169235A (en) Manufacture of original optical disk
JPS56125836A (en) Method for electron beam exposure
JPS53147534A (en) Recording method by means of laser
JPS5740928A (en) Processing method of resist
JPS55140229A (en) Method for formation of fine pattern
JPS6487169A (en) Laser marking device
JPS5712522A (en) Forming method of pattern
JPS56116626A (en) Pattern formation
JPS5799738A (en) Charged beam exposure method
JPS56115534A (en) Formation of pattern
JPS55140228A (en) Method for formation of pattern
JPS5732630A (en) Repair of defect on photomask
JPS5339078A (en) Electron beam exposure method