JPS56107555A - Detection of position of electron beam - Google Patents

Detection of position of electron beam

Info

Publication number
JPS56107555A
JPS56107555A JP907580A JP907580A JPS56107555A JP S56107555 A JPS56107555 A JP S56107555A JP 907580 A JP907580 A JP 907580A JP 907580 A JP907580 A JP 907580A JP S56107555 A JPS56107555 A JP S56107555A
Authority
JP
Japan
Prior art keywords
photoresist
pattern
mark
electron beams
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP907580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6227728B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP907580A priority Critical patent/JPS56107555A/ja
Publication of JPS56107555A publication Critical patent/JPS56107555A/ja
Publication of JPS6227728B2 publication Critical patent/JPS6227728B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP907580A 1980-01-29 1980-01-29 Detection of position of electron beam Granted JPS56107555A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP907580A JPS56107555A (en) 1980-01-29 1980-01-29 Detection of position of electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP907580A JPS56107555A (en) 1980-01-29 1980-01-29 Detection of position of electron beam

Publications (2)

Publication Number Publication Date
JPS56107555A true JPS56107555A (en) 1981-08-26
JPS6227728B2 JPS6227728B2 (enrdf_load_stackoverflow) 1987-06-16

Family

ID=11710484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP907580A Granted JPS56107555A (en) 1980-01-29 1980-01-29 Detection of position of electron beam

Country Status (1)

Country Link
JP (1) JPS56107555A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004179165A (ja) * 2002-11-26 2004-06-24 Fei Co ターゲット修復用のイオンビーム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004179165A (ja) * 2002-11-26 2004-06-24 Fei Co ターゲット修復用のイオンビーム

Also Published As

Publication number Publication date
JPS6227728B2 (enrdf_load_stackoverflow) 1987-06-16

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