JPS5591968A - Film forming method by glow discharge - Google Patents
Film forming method by glow dischargeInfo
- Publication number
- JPS5591968A JPS5591968A JP16584878A JP16584878A JPS5591968A JP S5591968 A JPS5591968 A JP S5591968A JP 16584878 A JP16584878 A JP 16584878A JP 16584878 A JP16584878 A JP 16584878A JP S5591968 A JPS5591968 A JP S5591968A
- Authority
- JP
- Japan
- Prior art keywords
- support
- chamber
- film
- glow discharge
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/56—Three layers or more
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Vapour Deposition (AREA)
- Photoreceptors In Electrophotography (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16584878A JPS5591968A (en) | 1978-12-28 | 1978-12-28 | Film forming method by glow discharge |
DE19792951453 DE2951453A1 (de) | 1978-12-28 | 1979-12-20 | Verfahren zur erzeugung eines films unter anwendung von glimmentladung |
US06/412,076 US4404076A (en) | 1978-12-28 | 1982-08-27 | Film forming process utilizing discharge |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16584878A JPS5591968A (en) | 1978-12-28 | 1978-12-28 | Film forming method by glow discharge |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5591968A true JPS5591968A (en) | 1980-07-11 |
JPS6137354B2 JPS6137354B2 (ja) | 1986-08-23 |
Family
ID=15820141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16584878A Granted JPS5591968A (en) | 1978-12-28 | 1978-12-28 | Film forming method by glow discharge |
Country Status (3)
Country | Link |
---|---|
US (1) | US4404076A (ja) |
JP (1) | JPS5591968A (ja) |
DE (1) | DE2951453A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852650A (ja) * | 1981-09-24 | 1983-03-28 | Fuji Electric Corp Res & Dev Ltd | 電子写真用感光体の製造方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD150318A3 (de) * | 1980-02-08 | 1981-08-26 | Rainer Moeller | Verfahren und rohrreaktor zur plasmachemischen dampfphasenabscheidung und zum plasmaaetzen |
FR2490246A1 (fr) * | 1980-09-17 | 1982-03-19 | Cit Alcatel | Dispositif de deposition chimique activee sous plasma |
EP0060651B1 (en) * | 1981-03-16 | 1986-07-30 | Energy Conversion Devices, Inc. | Apparatus including improved cathode for continuous deposition of amorphous material |
FR2514033B1 (fr) * | 1981-10-02 | 1985-09-27 | Henaff Louis | Installation pour le depot de couches minces en grande surface en phase vapeur reactive par plasma |
US4501766A (en) * | 1982-02-03 | 1985-02-26 | Tokyo Shibaura Denki Kabushiki Kaisha | Film depositing apparatus and a film depositing method |
JPS59166238A (ja) * | 1983-03-10 | 1984-09-19 | Toshiba Corp | 薄膜形成装置 |
JPS59207620A (ja) * | 1983-05-10 | 1984-11-24 | Zenko Hirose | アモルフアスシリコン成膜装置 |
JPS6010618A (ja) * | 1983-06-30 | 1985-01-19 | Canon Inc | プラズマcvd装置 |
US4612207A (en) * | 1985-01-14 | 1986-09-16 | Xerox Corporation | Apparatus and process for the fabrication of large area thin film multilayers |
JPH0714032U (ja) * | 1993-08-03 | 1995-03-10 | 勇 神谷 | ソトーバスタンド |
JP4095272B2 (ja) * | 2001-09-25 | 2008-06-04 | 株式会社東芝 | 微粒子製造方法および微粒子製造装置 |
KR100455430B1 (ko) * | 2002-03-29 | 2004-11-06 | 주식회사 엘지이아이 | 열교환기 표면처리장비의 냉각장치 및 그 제조방법 |
JP6354149B2 (ja) * | 2013-12-18 | 2018-07-11 | 株式会社Ihi | プラズマ窒化装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1158930A (fr) * | 1956-10-01 | 1958-06-20 | Saint Gobain | Procédé de fabrication, à l'état de haute pureté, de métaux et d'autres éléments chimiques à caractère métallique |
US3068510A (en) * | 1959-12-14 | 1962-12-18 | Radiation Res Corp | Polymerizing method and apparatus |
NL266419A (ja) * | 1960-06-27 | |||
US3475307A (en) * | 1965-02-04 | 1969-10-28 | Continental Can Co | Condensation of monomer vapors to increase polymerization rates in a glow discharge |
US3471316A (en) * | 1965-06-14 | 1969-10-07 | Continental Can Co | Method of forming a flexible organic layer on metal by a pulsed electrical abnormal glow discharge |
US3600122A (en) * | 1966-03-11 | 1971-08-17 | Surface Aviat Corp | Method of grafting ethylenically unsaturated monomer to a polymeric substrate |
US3473459A (en) * | 1966-07-28 | 1969-10-21 | Polaroid Corp | Photographic processing apparatus |
CH519588A (de) * | 1970-02-13 | 1972-02-29 | Berghaus Elektrophysik Anst | Verfahren zur Bearbeitung eines Werkstückes mittels einer Glimmentladung und Apparatur zur Durchführung des Verfahrens |
DE2117933A1 (de) * | 1971-04-14 | 1972-10-19 | Siemens Ag | Verfahren zum Herstellen von Hohlkörpern aus Halbleitermaterial von beliebiger Länge |
US4064521A (en) * | 1975-07-28 | 1977-12-20 | Rca Corporation | Semiconductor device having a body of amorphous silicon |
US4317844A (en) * | 1975-07-28 | 1982-03-02 | Rca Corporation | Semiconductor device having a body of amorphous silicon and method of making the same |
FR2371524A1 (fr) * | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma |
US4282265A (en) * | 1980-01-14 | 1981-08-04 | Bristol-Myers Company | Fat compositions for infant formulas |
-
1978
- 1978-12-28 JP JP16584878A patent/JPS5591968A/ja active Granted
-
1979
- 1979-12-20 DE DE19792951453 patent/DE2951453A1/de active Granted
-
1982
- 1982-08-27 US US06/412,076 patent/US4404076A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852650A (ja) * | 1981-09-24 | 1983-03-28 | Fuji Electric Corp Res & Dev Ltd | 電子写真用感光体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE2951453C2 (ja) | 1988-04-28 |
DE2951453A1 (de) | 1980-07-17 |
JPS6137354B2 (ja) | 1986-08-23 |
US4404076A (en) | 1983-09-13 |
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