JPS5583234A - Electron beam exposure - Google Patents

Electron beam exposure

Info

Publication number
JPS5583234A
JPS5583234A JP15964378A JP15964378A JPS5583234A JP S5583234 A JPS5583234 A JP S5583234A JP 15964378 A JP15964378 A JP 15964378A JP 15964378 A JP15964378 A JP 15964378A JP S5583234 A JPS5583234 A JP S5583234A
Authority
JP
Japan
Prior art keywords
pattern
energy
absorbed
electron beam
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15964378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627689B2 (en:Method
Inventor
Atsushi Kikuchi
Akio Kanamaru
Nobumichi Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP15964378A priority Critical patent/JPS5583234A/ja
Publication of JPS5583234A publication Critical patent/JPS5583234A/ja
Publication of JPS627689B2 publication Critical patent/JPS627689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
JP15964378A 1978-12-20 1978-12-20 Electron beam exposure Granted JPS5583234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15964378A JPS5583234A (en) 1978-12-20 1978-12-20 Electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15964378A JPS5583234A (en) 1978-12-20 1978-12-20 Electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5583234A true JPS5583234A (en) 1980-06-23
JPS627689B2 JPS627689B2 (en:Method) 1987-02-18

Family

ID=15698188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15964378A Granted JPS5583234A (en) 1978-12-20 1978-12-20 Electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5583234A (en:Method)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843516A (ja) * 1981-09-08 1983-03-14 Fujitsu Ltd 電子ビ−ム露光方法
JPS5861628A (ja) * 1981-10-08 1983-04-12 Nippon Telegr & Teleph Corp <Ntt> 電子ビ−ム露光における近接効果補正方法
JPS59112621A (ja) * 1982-12-20 1984-06-29 Fujitsu Ltd 電子ビ−ム露光方法
JPS59172233A (ja) * 1983-03-19 1984-09-28 Fujitsu Ltd 電子ビ−ム露光方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5843516A (ja) * 1981-09-08 1983-03-14 Fujitsu Ltd 電子ビ−ム露光方法
JPS5861628A (ja) * 1981-10-08 1983-04-12 Nippon Telegr & Teleph Corp <Ntt> 電子ビ−ム露光における近接効果補正方法
JPS59112621A (ja) * 1982-12-20 1984-06-29 Fujitsu Ltd 電子ビ−ム露光方法
JPS59172233A (ja) * 1983-03-19 1984-09-28 Fujitsu Ltd 電子ビ−ム露光方法

Also Published As

Publication number Publication date
JPS627689B2 (en:Method) 1987-02-18

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