JPS5582466A - Preparation of thin-film transistor - Google Patents
Preparation of thin-film transistorInfo
- Publication number
- JPS5582466A JPS5582466A JP15563278A JP15563278A JPS5582466A JP S5582466 A JPS5582466 A JP S5582466A JP 15563278 A JP15563278 A JP 15563278A JP 15563278 A JP15563278 A JP 15563278A JP S5582466 A JPS5582466 A JP S5582466A
- Authority
- JP
- Japan
- Prior art keywords
- onto
- insulating
- insulating layer
- aluminum oxide
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15563278A JPS5582466A (en) | 1978-12-14 | 1978-12-14 | Preparation of thin-film transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15563278A JPS5582466A (en) | 1978-12-14 | 1978-12-14 | Preparation of thin-film transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5582466A true JPS5582466A (en) | 1980-06-21 |
Family
ID=15610221
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15563278A Pending JPS5582466A (en) | 1978-12-14 | 1978-12-14 | Preparation of thin-film transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5582466A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58209163A (ja) * | 1982-05-31 | 1983-12-06 | Toshiba Corp | 薄膜トランジスタ |
US6063205A (en) * | 1998-01-28 | 2000-05-16 | Cooper; Steven P. | Use of H2 O2 solution as a method of post lap cleaning |
JP2010045752A (ja) * | 2008-08-12 | 2010-02-25 | Tatung Univ | 高周波表面音響波デバイスおよびその基板 |
-
1978
- 1978-12-14 JP JP15563278A patent/JPS5582466A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58209163A (ja) * | 1982-05-31 | 1983-12-06 | Toshiba Corp | 薄膜トランジスタ |
US6063205A (en) * | 1998-01-28 | 2000-05-16 | Cooper; Steven P. | Use of H2 O2 solution as a method of post lap cleaning |
JP2010045752A (ja) * | 2008-08-12 | 2010-02-25 | Tatung Univ | 高周波表面音響波デバイスおよびその基板 |
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