JPS5572038A - Preparing semiconductor device - Google Patents
Preparing semiconductor deviceInfo
- Publication number
- JPS5572038A JPS5572038A JP14623678A JP14623678A JPS5572038A JP S5572038 A JPS5572038 A JP S5572038A JP 14623678 A JP14623678 A JP 14623678A JP 14623678 A JP14623678 A JP 14623678A JP S5572038 A JPS5572038 A JP S5572038A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- eaves
- etching
- tapered
- positive type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain a break-resistant tapered type etched pattern by providing a eaves-having positive type resist pattern, with the eaves being removed after an anisotropic plasma etching.
CONSTITUTION: A eaves-having resist pattern 2 is formed on the surface of Al 1 by use of double application of high and low sensitivity positive type photoresists together with the following exposure and development procedures. Then, an ion etching using BCl3 produces a pattern precisely defined or shadowed by the dimensions of the eaves, with the etching proceeding at right angle to the surface of Al 1. At the midway of the ion etching, a gas for etching the photoresist is introduced. As a result, an Al wiring pattern having tapered side face is obtained. The so formed tapered pattern is very fine and yet very resistant against wiring breakage.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14623678A JPS5572038A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14623678A JPS5572038A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5572038A true JPS5572038A (en) | 1980-05-30 |
Family
ID=15403175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14623678A Pending JPS5572038A (en) | 1978-11-27 | 1978-11-27 | Preparing semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5572038A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6196783A (en) * | 1984-10-17 | 1986-05-15 | Agency Of Ind Science & Technol | Forming method of fine pattern for josephson element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5081477A (en) * | 1973-11-19 | 1975-07-02 |
-
1978
- 1978-11-27 JP JP14623678A patent/JPS5572038A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5081477A (en) * | 1973-11-19 | 1975-07-02 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6196783A (en) * | 1984-10-17 | 1986-05-15 | Agency Of Ind Science & Technol | Forming method of fine pattern for josephson element |
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