JPS51148366A - Pattern formation method - Google Patents
Pattern formation methodInfo
- Publication number
- JPS51148366A JPS51148366A JP7257675A JP7257675A JPS51148366A JP S51148366 A JPS51148366 A JP S51148366A JP 7257675 A JP7257675 A JP 7257675A JP 7257675 A JP7257675 A JP 7257675A JP S51148366 A JPS51148366 A JP S51148366A
- Authority
- JP
- Japan
- Prior art keywords
- formation method
- pattern formation
- rise
- accuracy
- done
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To rise the accuracy of a thin plate pattern using an etched mask with gas plasma or the reverse method when an ion etching is done.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7257675A JPS51148366A (en) | 1975-06-14 | 1975-06-14 | Pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7257675A JPS51148366A (en) | 1975-06-14 | 1975-06-14 | Pattern formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51148366A true JPS51148366A (en) | 1976-12-20 |
JPS5414471B2 JPS5414471B2 (en) | 1979-06-07 |
Family
ID=13493335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7257675A Granted JPS51148366A (en) | 1975-06-14 | 1975-06-14 | Pattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51148366A (en) |
-
1975
- 1975-06-14 JP JP7257675A patent/JPS51148366A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5414471B2 (en) | 1979-06-07 |
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