JPS53113234A - Gas plasma etching method - Google Patents
Gas plasma etching methodInfo
- Publication number
- JPS53113234A JPS53113234A JP2835177A JP2835177A JPS53113234A JP S53113234 A JPS53113234 A JP S53113234A JP 2835177 A JP2835177 A JP 2835177A JP 2835177 A JP2835177 A JP 2835177A JP S53113234 A JPS53113234 A JP S53113234A
- Authority
- JP
- Japan
- Prior art keywords
- plasma etching
- etching method
- gas plasma
- etching
- masking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To accomplish precise formation of desired etching pattern through masking on the side to be etched of a substrate with a resist and entire coating on the other side thereof with a etching-proof material.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2835177A JPS53113234A (en) | 1977-03-15 | 1977-03-15 | Gas plasma etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2835177A JPS53113234A (en) | 1977-03-15 | 1977-03-15 | Gas plasma etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53113234A true JPS53113234A (en) | 1978-10-03 |
Family
ID=12246173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2835177A Pending JPS53113234A (en) | 1977-03-15 | 1977-03-15 | Gas plasma etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53113234A (en) |
-
1977
- 1977-03-15 JP JP2835177A patent/JPS53113234A/en active Pending
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