JPS5552266A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5552266A JPS5552266A JP12490378A JP12490378A JPS5552266A JP S5552266 A JPS5552266 A JP S5552266A JP 12490378 A JP12490378 A JP 12490378A JP 12490378 A JP12490378 A JP 12490378A JP S5552266 A JPS5552266 A JP S5552266A
- Authority
- JP
- Japan
- Prior art keywords
- diffusion
- layer
- channel
- section
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/857—Complementary IGFETs, e.g. CMOS comprising an N-type well but not a P-type well
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12490378A JPS5552266A (en) | 1978-10-11 | 1978-10-11 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12490378A JPS5552266A (en) | 1978-10-11 | 1978-10-11 | Semiconductor integrated circuit |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62133883A Division JPS6325965A (ja) | 1987-05-29 | 1987-05-29 | 半導体集積回路 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5552266A true JPS5552266A (en) | 1980-04-16 |
JPS6252473B2 JPS6252473B2 (enrdf_load_stackoverflow) | 1987-11-05 |
Family
ID=14896952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12490378A Granted JPS5552266A (en) | 1978-10-11 | 1978-10-11 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5552266A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60116165A (ja) * | 1983-11-09 | 1985-06-22 | シーメンス、アクチエンゲゼルシヤフト | 超高密度集積回路のmosトランジスタの製造方法 |
US4684971A (en) * | 1981-03-13 | 1987-08-04 | American Telephone And Telegraph Company, At&T Bell Laboratories | Ion implanted CMOS devices |
US4724221A (en) * | 1981-10-28 | 1988-02-09 | U.S. Philips Corporation | High-speed, low-power-dissipation integrated circuits |
JPH0653420A (ja) * | 1992-06-16 | 1994-02-25 | Samsung Electron Co Ltd | BiCMOSトランジスタ及びその製造方法 |
US5391904A (en) * | 1988-09-01 | 1995-02-21 | Fujitsu Limited | Semiconductor delay circuit device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0313871U (enrdf_load_stackoverflow) * | 1989-06-23 | 1991-02-13 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5226177A (en) * | 1975-08-25 | 1977-02-26 | Toshiba Corp | Semi-conductor unit |
-
1978
- 1978-10-11 JP JP12490378A patent/JPS5552266A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5226177A (en) * | 1975-08-25 | 1977-02-26 | Toshiba Corp | Semi-conductor unit |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4684971A (en) * | 1981-03-13 | 1987-08-04 | American Telephone And Telegraph Company, At&T Bell Laboratories | Ion implanted CMOS devices |
US4724221A (en) * | 1981-10-28 | 1988-02-09 | U.S. Philips Corporation | High-speed, low-power-dissipation integrated circuits |
JPS60116165A (ja) * | 1983-11-09 | 1985-06-22 | シーメンス、アクチエンゲゼルシヤフト | 超高密度集積回路のmosトランジスタの製造方法 |
US5391904A (en) * | 1988-09-01 | 1995-02-21 | Fujitsu Limited | Semiconductor delay circuit device |
JPH0653420A (ja) * | 1992-06-16 | 1994-02-25 | Samsung Electron Co Ltd | BiCMOSトランジスタ及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6252473B2 (enrdf_load_stackoverflow) | 1987-11-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5413779A (en) | Semiconductor integrated circuit device | |
JPS5493981A (en) | Semiconductor device | |
JPS5688354A (en) | Semiconductor integrated circuit device | |
JPS5552266A (en) | Semiconductor integrated circuit | |
KR890005891A (ko) | 반도체 집적회로 장치 및 그 제조방법 | |
JPS55132072A (en) | Mos semiconductor device | |
JPS5619660A (en) | Complementary mis logic circuit | |
JPS5552267A (en) | Semiconductor meomory | |
JPS5565455A (en) | Manufacture of semiconductor device | |
JPS5448179A (en) | Mis-type semiconductor integrated circuit device | |
JPS5723259A (en) | Complementary type mos semiconductor device | |
JPS5610958A (en) | Semiconductor circuit | |
JPS6427239A (en) | Semiconductor integrated circuit | |
JPS6427272A (en) | Semiconductor device | |
JPS5567166A (en) | Preparation of mos type semiconductor device | |
JPS54128295A (en) | Mis-type semiconductor integrated circuit device | |
JPS55150269A (en) | Semiconductor integrated circuit | |
JPS5762565A (en) | Semiconductor device | |
JPS5632767A (en) | Mos inverter | |
JPS5583265A (en) | Semiconductor device and method of fabricating the same | |
JPS5586159A (en) | Protective circuit for mos semiconductor device | |
JPS5552254A (en) | Semiconductor device | |
JPS5736868A (en) | Manufacture of nonvolatile semiconductor memory device | |
JPS5478672A (en) | Complementary silicon gate mos field effect semiconductor device and its manufacture | |
JPS5578572A (en) | Cmos-transistor circuit |