JPS5548744A - Photosensitive elastomer composition - Google Patents

Photosensitive elastomer composition

Info

Publication number
JPS5548744A
JPS5548744A JP12137178A JP12137178A JPS5548744A JP S5548744 A JPS5548744 A JP S5548744A JP 12137178 A JP12137178 A JP 12137178A JP 12137178 A JP12137178 A JP 12137178A JP S5548744 A JPS5548744 A JP S5548744A
Authority
JP
Japan
Prior art keywords
elastomer composition
photosensitive
transition temperature
glass transition
polymer block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12137178A
Other languages
English (en)
Other versions
JPS607261B2 (ja
Inventor
Shohei Nakamura
Yoshiyuki Suenaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP53121371A priority Critical patent/JPS607261B2/ja
Priority to GB7933581A priority patent/GB2033598B/en
Priority to US06/080,364 priority patent/US4266005A/en
Priority to FR7924405A priority patent/FR2438282A1/fr
Priority to DE2939989A priority patent/DE2939989C2/de
Publication of JPS5548744A publication Critical patent/JPS5548744A/ja
Publication of JPS607261B2 publication Critical patent/JPS607261B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP53121371A 1978-10-02 1978-10-02 感光性エラストマ−組成物 Expired JPS607261B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP53121371A JPS607261B2 (ja) 1978-10-02 1978-10-02 感光性エラストマ−組成物
GB7933581A GB2033598B (en) 1978-10-02 1979-09-27 Photosensitive elastomeric composition
US06/080,364 US4266005A (en) 1978-10-02 1979-09-28 Photosensitive elastomeric composition
FR7924405A FR2438282A1 (fr) 1978-10-02 1979-10-01 Composition elastomere photosensible
DE2939989A DE2939989C2 (de) 1978-10-02 1979-10-02 Lichtempfindliches Gemisch und flexographische Druckplatte

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53121371A JPS607261B2 (ja) 1978-10-02 1978-10-02 感光性エラストマ−組成物

Publications (2)

Publication Number Publication Date
JPS5548744A true JPS5548744A (en) 1980-04-08
JPS607261B2 JPS607261B2 (ja) 1985-02-23

Family

ID=14809571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53121371A Expired JPS607261B2 (ja) 1978-10-02 1978-10-02 感光性エラストマ−組成物

Country Status (5)

Country Link
US (1) US4266005A (ja)
JP (1) JPS607261B2 (ja)
DE (1) DE2939989C2 (ja)
FR (1) FR2438282A1 (ja)
GB (1) GB2033598B (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62231248A (ja) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd 感光性エラストマ−組成物
JPS63229451A (ja) * 1987-02-28 1988-09-26 ビーエーエスエフ　アクチェンゲゼルシャフト 高められた可撓性を有する感光性記録材料
JPH01188851A (ja) * 1988-01-22 1989-07-28 Konica Corp 湿し水不要平版印刷版材料
JPH035754A (ja) * 1989-06-01 1991-01-11 Fuji Photo Film Co Ltd 平版印刷版の製造方法
WO2001059022A1 (fr) 2000-02-09 2001-08-16 Asahi Kasei Kabushiki Kaisha Liquide de revetement sensible aux infrarouges
US6684782B1 (en) 1998-12-25 2004-02-03 Asahi Kasei Kabushiki Kaisha Flexopgraphic printing plate and raw plate therefor

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO801021L (no) * 1979-04-10 1980-10-13 Akzo Nv Ultrafiolett herdbart belegg.
DE2942183A1 (de) * 1979-10-18 1981-05-07 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
JPS57208556A (en) 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
EP0099949B1 (en) * 1982-07-27 1985-12-11 E.I. Du Pont De Nemours And Company Improved aqueous processable, positive-working photopolymer compositions
EP0113313B1 (de) * 1982-11-04 1987-07-15 Ciba-Geigy Ag In Gegenwart von Sensibilisatoren unter Lichteinwirkung vernetzbare Stoffgemische und deren Verwendung
US4857435A (en) * 1983-11-01 1989-08-15 Hoechst Celanese Corporation Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer
US5059513A (en) * 1983-11-01 1991-10-22 Hoechst Celanese Corporation Photochemical image process of positive photoresist element with maleimide copolymer
US4578328A (en) * 1984-07-09 1986-03-25 General Electric Company Photopatternable polyimide compositions and method for making
DE3600774C1 (de) * 1986-01-14 1987-05-07 Du Pont Deutschland Verfahren zum Verkleben von photopolymerisierbaren Druckplatten oder Druckformen fuer den Flexodruck
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
US4851454A (en) * 1986-07-17 1989-07-25 The Dow Chemical Company Photolytically crosslinkable thermally stable composition
JPS6370242A (ja) * 1986-09-11 1988-03-30 Nippon Zeon Co Ltd 感光性エラストマ−組成物
US5288571A (en) * 1986-10-02 1994-02-22 Asahi Kasei Kogyo Kabushiki Kaisha Photoresin printing plate for use in printing a corrugated board
JPS63154362U (ja) * 1987-03-31 1988-10-11
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
NZ237919A (en) * 1990-04-26 1994-09-27 Grace W R & Co Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates
DE4022980C1 (ja) * 1990-07-19 1991-08-08 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
DE4022979C1 (ja) * 1990-07-19 1991-08-08 Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De
US5250389A (en) * 1991-02-15 1993-10-05 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
DE69207902T2 (de) * 1991-03-25 1996-06-20 Exxon Chemical Patents Inc Pfropfpolymere aus isomonoolefin und alkylstyrol
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
DE19639767A1 (de) * 1996-09-27 1998-04-02 Du Pont Deutschland Flexographische Druckformen für UV härtbare Druckfarben
DE19639761A1 (de) * 1996-09-27 1998-04-02 Du Pont Deutschland Flexographische Druckformen mit verbesserter Beständigkeit gegenüber UV härtbaren Druckfarben
US7728049B2 (en) * 1996-10-08 2010-06-01 Zamore Alan M Irradiation conversion of thermoplastic to thermoset polymers
US7749585B2 (en) * 1996-10-08 2010-07-06 Alan Zamore Reduced profile medical balloon element
US5900444A (en) * 1996-10-08 1999-05-04 Zamore; Alan Irradiation conversion of thermoplastic to thermoset polyurethane
US6596818B1 (en) * 1996-10-08 2003-07-22 Alan M. Zamore Irradiation conversion of thermoplastic to thermoset polymers
US6656550B1 (en) 1996-10-08 2003-12-02 Alan M. Zamore Dilatation device of uniform outer diameter
DE19654103A1 (de) * 1996-12-23 1998-06-25 Du Pont Deutschland Verfahren zum Kantenverkleben von photopolymerisierbaren Druckplatten oder Photopolymerdruckformen für den Flexodruck
DE19703917A1 (de) * 1997-02-03 1998-08-06 Du Pont Deutschland Flexographische Druckformen für den Wellpappendruck
BR9908044A (pt) 1998-01-30 2000-11-28 First Chemical Corp Composições de fotopolimerização incluindo maleimidas e processos para usar as mesmas
JP3640149B2 (ja) * 1999-08-27 2005-04-20 東亞合成株式会社 活性エネルギー線硬化型接着剤組成物
US7012118B2 (en) * 2002-02-07 2006-03-14 Kraton Polymers U.S. Llc Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
US7241540B2 (en) * 2004-04-27 2007-07-10 Kraton Polymers U.S. Llc Photocurable compositions and flexographic printing plates comprising the same
US7704676B2 (en) * 2007-09-04 2010-04-27 Kraton Polymers U.S. Llc Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers
JP2009214428A (ja) * 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP5193276B2 (ja) * 2010-12-10 2013-05-08 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版及びその製造方法、並びに、レリーフ印刷版の製版方法
CN104684998B (zh) * 2012-10-04 2017-04-12 日本瑞翁株式会社 橡胶组合物的制造方法
EP3730305A4 (en) 2017-12-21 2020-12-09 Konica Minolta, Inc. PRE-TREATMENT LIQUID FOR INKJET RECORDING, MANUFACTURING METHOD FOR THEREOF, LIQUID KIT FOR INKJET RECORDING, PRINT PRODUCT AND INKJET RECORDING METHOD

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3551160A (en) * 1967-10-13 1970-12-29 Ibm Method of preparing photosensitive poly(2-chloro-1,3-butadiene)
US3627529A (en) * 1968-10-11 1971-12-14 Grace W R & Co Process for preparing a lithographic printing plate
GB1278780A (en) * 1968-12-24 1972-06-21 Agfa Gevaert Photodimerisation and photopolymerisation of bis-maleimides
US3634547A (en) * 1969-07-17 1972-01-11 Ici Ltd Thermoplastic compositions
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
DE2112141A1 (de) * 1971-03-13 1972-10-05 Agfa Gevaert Ag Photographisches Material
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
DE2130904C3 (de) * 1971-06-22 1974-06-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Homogene lichtvernetzbare Schichten liefernde Gemische
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
US4162919A (en) * 1974-11-29 1979-07-31 Basf Aktiengesellschaft Laminates for the manufacture of flexographic printing plates using block copolymers
DE2457882B2 (de) * 1974-12-06 1977-06-02 Siemens AG, 1000 Berlin und 8000 München Waermebestaendige, lichtvernetzbare massen
US4045231A (en) * 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
FR2318441A1 (fr) * 1975-07-17 1977-02-11 Nippon Paint Co Ltd Composition
JPS5946522B2 (ja) * 1976-12-10 1984-11-13 日石三菱株式会社 水分散性塗膜形成物質の製造方法
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62231248A (ja) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd 感光性エラストマ−組成物
JPS63229451A (ja) * 1987-02-28 1988-09-26 ビーエーエスエフ　アクチェンゲゼルシャフト 高められた可撓性を有する感光性記録材料
JPH01188851A (ja) * 1988-01-22 1989-07-28 Konica Corp 湿し水不要平版印刷版材料
JPH035754A (ja) * 1989-06-01 1991-01-11 Fuji Photo Film Co Ltd 平版印刷版の製造方法
US6684782B1 (en) 1998-12-25 2004-02-03 Asahi Kasei Kabushiki Kaisha Flexopgraphic printing plate and raw plate therefor
WO2001059022A1 (fr) 2000-02-09 2001-08-16 Asahi Kasei Kabushiki Kaisha Liquide de revetement sensible aux infrarouges
US6653046B2 (en) 2000-02-09 2003-11-25 Asahi Kasei Kabushiki Kaisha Infrared sensitive coating liquid

Also Published As

Publication number Publication date
FR2438282B1 (ja) 1982-11-12
FR2438282A1 (fr) 1980-04-30
DE2939989C2 (de) 1985-12-19
DE2939989A1 (de) 1980-04-03
JPS607261B2 (ja) 1985-02-23
GB2033598B (en) 1982-11-10
US4266005A (en) 1981-05-05
GB2033598A (en) 1980-05-21

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