JPS5541753A - Semiconductor memory - Google Patents
Semiconductor memoryInfo
- Publication number
- JPS5541753A JPS5541753A JP11527678A JP11527678A JPS5541753A JP S5541753 A JPS5541753 A JP S5541753A JP 11527678 A JP11527678 A JP 11527678A JP 11527678 A JP11527678 A JP 11527678A JP S5541753 A JPS5541753 A JP S5541753A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- layer
- polycrystal
- gate
- memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
- 230000000630 rising effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/33—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor extending under the transistor
Landscapes
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To increase the density of memory-cell integration by providing embeded regions in a memory device and using them as juntion capacitances. CONSTITUTION:A plurality of N<+> embeded regions 2 are diffused in a P<+> Si substrate 1, the regions 2 are surrounded by an SiO2 film 3, and P-type layer is epitaxially grown all over the surface. Then, P<+> monocrystal layer 4s is formed on the regions 2 to prevent the rising of the regions 2, and a P<+> polycrystal layer 4p is formed on the film 3. Thereafter, P<-> monocrystal layer 5s and P<-> polycrystal layer 5p are stacked and epitaxially grown on the layer 4s and 4p, respectively, and oxidized films 6 are formed in the polycrystal layers 5p and 4p, thereby memory-cell portion is separated. Two gate-oxidized films 7 and Si-gate electrodes 8 are vertically provided on the monocrystal layer 5s, which is centrally located, at the positions opposing the regions 2. An N<+> source region 10 and drain regions 11 are diffused on both sides of the gate-oxidized films 7 and in the regions 2. Then, a PSG film 9 is provided all over the surface, an opening is provided, and an Al- electrode wire 12 which is connected to the region 10 is deposited.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53115276A JPS6036106B2 (en) | 1978-09-20 | 1978-09-20 | semiconductor storage device |
DE7979301928T DE2967388D1 (en) | 1978-09-20 | 1979-09-18 | Semiconductor memory device and process for fabricating the device |
EP79301928A EP0009910B1 (en) | 1978-09-20 | 1979-09-18 | Semiconductor memory device and process for fabricating the device |
CA000335866A CA1144646A (en) | 1978-09-20 | 1979-09-18 | Dynamic ram having buried capacitor and planar gate |
US06/076,993 US4329704A (en) | 1978-09-20 | 1979-09-19 | MOS Random access memory with buried storage capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53115276A JPS6036106B2 (en) | 1978-09-20 | 1978-09-20 | semiconductor storage device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5541753A true JPS5541753A (en) | 1980-03-24 |
JPS6036106B2 JPS6036106B2 (en) | 1985-08-19 |
Family
ID=14658644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53115276A Expired JPS6036106B2 (en) | 1978-09-20 | 1978-09-20 | semiconductor storage device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6036106B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5843779A (en) * | 1981-09-08 | 1983-03-14 | Ookura Syuzo Kk | Brewing method of japanese sake |
JPS58204568A (en) * | 1982-05-24 | 1983-11-29 | Hitachi Ltd | Semiconductor device |
JPS5998678A (en) * | 1982-11-30 | 1984-06-07 | Masaharu Uematsu | Dried alpha-type white bran and its preparation |
JPS5998679A (en) * | 1982-11-30 | 1984-06-07 | Masaharu Uematsu | Dried alpha-type white bran for preparation of japanese sake, and its preparation |
JPS62107766A (en) * | 1985-11-07 | 1987-05-19 | Nisshin Flour Milling Co Ltd | Production of processed raw material for brewing |
JPS62171666A (en) * | 1986-01-22 | 1987-07-28 | Tech Res Assoc Extru Cook Food Ind | Production of secondary raw material for 'shochu' |
-
1978
- 1978-09-20 JP JP53115276A patent/JPS6036106B2/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5843779A (en) * | 1981-09-08 | 1983-03-14 | Ookura Syuzo Kk | Brewing method of japanese sake |
JPH0240313B2 (en) * | 1981-09-08 | 1990-09-11 | Gekkeikan Kk | |
JPS58204568A (en) * | 1982-05-24 | 1983-11-29 | Hitachi Ltd | Semiconductor device |
JPH046106B2 (en) * | 1982-05-24 | 1992-02-04 | Hitachi Ltd | |
JPS5998678A (en) * | 1982-11-30 | 1984-06-07 | Masaharu Uematsu | Dried alpha-type white bran and its preparation |
JPS5998679A (en) * | 1982-11-30 | 1984-06-07 | Masaharu Uematsu | Dried alpha-type white bran for preparation of japanese sake, and its preparation |
JPS62107766A (en) * | 1985-11-07 | 1987-05-19 | Nisshin Flour Milling Co Ltd | Production of processed raw material for brewing |
JPH0517826B2 (en) * | 1985-11-07 | 1993-03-10 | Nisshin Flour Milling Co | |
JPS62171666A (en) * | 1986-01-22 | 1987-07-28 | Tech Res Assoc Extru Cook Food Ind | Production of secondary raw material for 'shochu' |
JPH0113836B2 (en) * | 1986-01-22 | 1989-03-08 | Suehiro Tetsukosho Kk |
Also Published As
Publication number | Publication date |
---|---|
JPS6036106B2 (en) | 1985-08-19 |
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