JPS5531115A - Anti-contamination, vacuum plasma film-forming apparatus - Google Patents

Anti-contamination, vacuum plasma film-forming apparatus

Info

Publication number
JPS5531115A
JPS5531115A JP10286778A JP10286778A JPS5531115A JP S5531115 A JPS5531115 A JP S5531115A JP 10286778 A JP10286778 A JP 10286778A JP 10286778 A JP10286778 A JP 10286778A JP S5531115 A JPS5531115 A JP S5531115A
Authority
JP
Japan
Prior art keywords
substrate
gas
torr
contamination
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10286778A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5759306B2 (enrdf_load_stackoverflow
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP10286778A priority Critical patent/JPS5531115A/ja
Publication of JPS5531115A publication Critical patent/JPS5531115A/ja
Publication of JPS5759306B2 publication Critical patent/JPS5759306B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP10286778A 1978-08-25 1978-08-25 Anti-contamination, vacuum plasma film-forming apparatus Granted JPS5531115A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10286778A JPS5531115A (en) 1978-08-25 1978-08-25 Anti-contamination, vacuum plasma film-forming apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10286778A JPS5531115A (en) 1978-08-25 1978-08-25 Anti-contamination, vacuum plasma film-forming apparatus

Publications (2)

Publication Number Publication Date
JPS5531115A true JPS5531115A (en) 1980-03-05
JPS5759306B2 JPS5759306B2 (enrdf_load_stackoverflow) 1982-12-14

Family

ID=14338849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10286778A Granted JPS5531115A (en) 1978-08-25 1978-08-25 Anti-contamination, vacuum plasma film-forming apparatus

Country Status (1)

Country Link
JP (1) JPS5531115A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2497237A1 (fr) * 1980-12-27 1982-07-02 Clarion Co Ltd Appareil de pulverisation " cathodique "
JPS58161634U (ja) * 1982-04-21 1983-10-27 日本電気株式会社 反応性イオンプレ−テイング装置
KR100526007B1 (ko) * 2000-12-28 2005-11-08 엘지.필립스 엘시디 주식회사 플라즈마 에칭장치
CN106903412A (zh) * 2017-04-28 2017-06-30 成都大漠石油技术有限公司 利于提高大型管道焊接质量的装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS599502A (ja) * 1982-07-08 1984-01-18 Sumitomo Light Metal Ind Ltd 内面塗装管の検査方法
JPS632154U (enrdf_load_stackoverflow) * 1986-06-23 1988-01-08
JPH02141651A (ja) * 1988-11-22 1990-05-31 Mitsui Petrochem Ind Ltd 管内面コート金属管のコート状態検査方法及び装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579430A (en) * 1980-06-18 1982-01-18 Hitachi Ltd Electric cleaner

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579430A (en) * 1980-06-18 1982-01-18 Hitachi Ltd Electric cleaner

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2497237A1 (fr) * 1980-12-27 1982-07-02 Clarion Co Ltd Appareil de pulverisation " cathodique "
JPS58161634U (ja) * 1982-04-21 1983-10-27 日本電気株式会社 反応性イオンプレ−テイング装置
KR100526007B1 (ko) * 2000-12-28 2005-11-08 엘지.필립스 엘시디 주식회사 플라즈마 에칭장치
CN106903412A (zh) * 2017-04-28 2017-06-30 成都大漠石油技术有限公司 利于提高大型管道焊接质量的装置

Also Published As

Publication number Publication date
JPS5759306B2 (enrdf_load_stackoverflow) 1982-12-14

Similar Documents

Publication Publication Date Title
US4728529A (en) Method of producing diamond-like carbon-coatings
US5698039A (en) Process for cleaning a substrate using a barrier discharge
SG149680A1 (en) Film formation apparatus and film formation method and cleaning method
CA2411174A1 (en) A process and apparatus for plasma activated deposition in a vacuum
WO2001037310A3 (en) Method and apparatus for ionized physical vapor deposition
CA2107242A1 (en) An Evaporation System for Gas Jet Deposition on Thin Film Materials
JPS5531115A (en) Anti-contamination, vacuum plasma film-forming apparatus
JPS5713174A (en) Reactive sputtering method
JPS5586169A (en) Manufacture of organic photo-conducting film
WO2003069013A3 (en) Plasma processing apparatus
WO2002023587A3 (en) Tungsten chamber with stationary heater
US4606929A (en) Method of ionized-plasma spraying and apparatus for performing same
GB1172106A (en) Improvements in or relating to Pressure Control in Vacuum Apparatus
KR960019562A (ko) 프라즈마- 화학적 코팅 기법
JP2021533275A (ja) アーク放電を低減させた物理的気相堆積（ｐｖｄ）チャンバ
JPS5773174A (en) Manufacturing apparatus for coating film
JPS5794338A (en) Vapor deposition device
JPS5719034A (en) Vapor growth apparatus
JPS6425976A (en) Sputtering device
JPS55110028A (en) Apparatus for vacuum evaporation having evaporation source for ion beam sputtering
JPS5767636A (en) Method and apparatus for continuous plasma treatment
JPS6446916A (en) Vacuum thin-film formation device
JPH05222554A (ja) 大面積加工物表面イオンエッチング用装置
JPS5732637A (en) Dry etching apparatus
JPS5663821A (en) Manufacture of zinc oxide film