GB1172106A - Improvements in or relating to Pressure Control in Vacuum Apparatus - Google Patents

Improvements in or relating to Pressure Control in Vacuum Apparatus

Info

Publication number
GB1172106A
GB1172106A GB3001167A GB3001167A GB1172106A GB 1172106 A GB1172106 A GB 1172106A GB 3001167 A GB3001167 A GB 3001167A GB 3001167 A GB3001167 A GB 3001167A GB 1172106 A GB1172106 A GB 1172106A
Authority
GB
United Kingdom
Prior art keywords
gas
chamber
region
sputtering
evacuated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3001167A
Inventor
Colin Richard Dougl Priestland
Geoffrey Norman Jackson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards High Vacuum International Ltd
Original Assignee
Edwards High Vacuum International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards High Vacuum International Ltd filed Critical Edwards High Vacuum International Ltd
Priority to GB3001167A priority Critical patent/GB1172106A/en
Publication of GB1172106A publication Critical patent/GB1172106A/en
Application status is Expired legal-status Critical

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00Control of fluid pressure
    • G05D16/14Control of fluid pressure with auxiliary non-electric power
    • G05D16/18Control of fluid pressure with auxiliary non-electric power derived from an external source
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
    • H01J37/34Gas-filled discharge tubes, e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions operating with cathodic sputtering

Abstract

1,172,106. Coating by sputtering. EDWARDS HIGH VACUUM INTERNATIONAL Ltd. May 31, 1968 [June 29, 1967], No. 30011/67. Heading C7F. In sputtering apparatus, in which gas is continuously fed and evacuated from a chamber, the inlet and outlet are so arranged in a region that the presence of the incoming gas does not affect the pressure in the chamber other than in this region. In a sputtering apparatus, Fig. 1, gas is introduced at 3 and evacuated through a duct 6, the region being defined by baffles 5. Substrates 7, 8 are mounted on a rotatable holder. Sputtering deposition taking place on substrate, whilst the pressure in the rest of the chamber is low enough to allow vapour deposition on substrate 8. In a modification Figs. 3 and 4 (not shown) a secondary pumping outlet is provided. In other modifications R. F. frequency and a magnetic field may be used and a grid bias may be placed in the evacuating duct to prevent ionized gas from reaching the pump.
GB3001167A 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus Expired GB1172106A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB3001167A GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB3001167A GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus
US3629095D US3629095A (en) 1967-06-29 1968-06-21 In or relating to vacuum apparatus
DE19681767863 DE1767863A1 (en) 1967-06-29 1968-06-25 Vacuum apparatus and methods for regulating the pressure in a particular zone of a vacuum chamber

Publications (1)

Publication Number Publication Date
GB1172106A true GB1172106A (en) 1969-11-26

Family

ID=10300834

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3001167A Expired GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus

Country Status (3)

Country Link
US (1) US3629095A (en)
DE (1) DE1767863A1 (en)
GB (1) GB1172106A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502242A2 (en) * 1991-03-04 1992-09-09 Leybold Aktiengesellschaft Process and apparatus for reactive coating of a substrate
EP0790326A1 (en) 1996-02-17 1997-08-20 Leybold Systems GmbH Process for depositing an optical transparent and electrical conductive layer on a substrate of transparent material

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2324755B1 (en) * 1975-09-19 1978-09-22 Anvar
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5689031A (en) 1995-10-17 1997-11-18 Exxon Research & Engineering Company Synthetic diesel fuel and process for its production

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3139396A (en) * 1962-06-28 1964-06-30 Bell Telephone Labor Inc Tin oxide resistors
US3294669A (en) * 1963-07-22 1966-12-27 Bell Telephone Labor Inc Apparatus for sputtering in a highly purified gas atmosphere
US3296115A (en) * 1964-03-02 1967-01-03 Schjeldahl Co G T Sputtering of metals wherein gas flow is confined to increase the purity of deposition
US3287243A (en) * 1965-03-29 1966-11-22 Bell Telephone Labor Inc Deposition of insulating films by cathode sputtering in an rf-supported discharge
US3451917A (en) * 1966-01-10 1969-06-24 Bendix Corp Radio frequency sputtering apparatus
US3458426A (en) * 1966-05-25 1969-07-29 Fabri Tek Inc Symmetrical sputtering apparatus with plasma confinement
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502242A2 (en) * 1991-03-04 1992-09-09 Leybold Aktiengesellschaft Process and apparatus for reactive coating of a substrate
US5169509A (en) * 1991-03-04 1992-12-08 Leybold Aktiengesellschaft Apparatus for the reactive coating of a substrate
EP0502242A3 (en) * 1991-03-04 1993-12-15 Leybold Ag Process and apparatus for reactive coating of a substrate
EP0790326A1 (en) 1996-02-17 1997-08-20 Leybold Systems GmbH Process for depositing an optical transparent and electrical conductive layer on a substrate of transparent material
DE19605932A1 (en) * 1996-02-17 1997-08-21 Leybold Systems Gmbh A method of depositing an optically transparent and electrically conductive layer on a substrate made of translucent material

Also Published As

Publication number Publication date
DE1767863A1 (en) 1972-02-17
US3629095A (en) 1971-12-21

Similar Documents

Publication Publication Date Title
US3594295A (en) Rf sputtering of insulator materials
KR960029488A (en) Cylindrical magnetron shielding structure and deposition method
JP3231900B2 (en) The film-forming apparatus
TW357404B (en) Apparatus and method for processing of plasma
KR970070232A (en) Sputtering deposition apparatus
CN87107161A (en) Composition film forming device
CA2218158A1 (en) Mass spectrometer system and method for transporting and analyzing ions
WO2004027112A3 (en) An apparatus for the deposition of high dielectric constant films
GB1311042A (en) Rf sputtering apparatus
GB1559269A (en) Treatment of a workpiece
JPH03180473A (en) Chemical vapor deposition to selected surface
JPH02101169A (en) Apparatus for vapor phase working or disk-shaped work
GB1485331A (en) Multitarget sequential sputtering apparatus
EP0629715B1 (en) Apparatus for continuous reactive metal deposition in vacuum and its application
JPH03146674A (en) Chemical treatment apparatus assisted by diffusion plasma
JPS60114570A (en) Evacuating system for plasma cvd device
JPH01180970A (en) Vacuum surface treatment device
JPS59179152A (en) Production of thin film
JPS6333566A (en) Electric charge particle applying device
KR100532805B1 (en) Apparatus and method for depositing a film on a substrate
JPS5816078A (en) Plasma etching device
JPS6052574A (en) Continuous sputtering device
JPS61107720A (en) Molecular beam epitaxy equipment
WO1999067440A3 (en) Substrate support member with a purge gas channel and pumping system
JPH0234911A (en) Manufacture of amorphous semiconductor alloy and element, using microwave energy

Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees