JPS6414727A - Apparatus for producing magnetic recording medium - Google Patents
Apparatus for producing magnetic recording mediumInfo
- Publication number
- JPS6414727A JPS6414727A JP17179287A JP17179287A JPS6414727A JP S6414727 A JPS6414727 A JP S6414727A JP 17179287 A JP17179287 A JP 17179287A JP 17179287 A JP17179287 A JP 17179287A JP S6414727 A JPS6414727 A JP S6414727A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- vapor deposition
- pressure
- duct
- deposition section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
PURPOSE:To prevent the degradation in ion beam intensity and to improve magnetic characteristics by decreasing the pressure in an ion beam route positioned between a means for projecting the ion beam and means for supporting a substrate lower than the pressure in a vessel around the same. CONSTITUTION:The ion beam 22 arrives at the vapor deposition section by being passed through the ion beam flying route the internal pressure of which is maintained lower than the pressure in the vapor deposition chamber around the same by a duct 23 which is connected to the front end of an ion gun 19 and is disposed with the open end thereof near to the vapor deposition section mentioned above, a duct 24 which is led out of a part of the duct 23, and a differential evacuating means 25 consisting of a pump for a high vacuum, baffle, valve, etc. Namely, the particles of the vapor flow 14 of a magnetic material 12 arriving at the vapor deposition section react efficiently with the ion beam 22 arriving at the vapor deposition section at the decreased collision against the residual gas without decreasing the intensity thereby in the ion beam flying route which is partitioned from the circumference by the dust 23 and the maintained under the additionally lower pressure by differential evacuation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17179287A JPH0646456B2 (en) | 1987-07-09 | 1987-07-09 | Magnetic recording medium manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17179287A JPH0646456B2 (en) | 1987-07-09 | 1987-07-09 | Magnetic recording medium manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6414727A true JPS6414727A (en) | 1989-01-18 |
| JPH0646456B2 JPH0646456B2 (en) | 1994-06-15 |
Family
ID=15929782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17179287A Expired - Fee Related JPH0646456B2 (en) | 1987-07-09 | 1987-07-09 | Magnetic recording medium manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0646456B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02250953A (en) * | 1989-03-23 | 1990-10-08 | Toppan Printing Co Ltd | Production of vapor deposited film |
| US6191399B1 (en) | 2000-02-01 | 2001-02-20 | Asm America, Inc. | System of controlling the temperature of a processing chamber |
| US7173216B2 (en) | 2002-08-09 | 2007-02-06 | Asm America, Inc. | LED heat lamp arrays for CVD heating |
| JP2016084494A (en) * | 2014-10-24 | 2016-05-19 | 東レフィルム加工株式会社 | Thin film deposition apparatus, and thin film deposition method |
-
1987
- 1987-07-09 JP JP17179287A patent/JPH0646456B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02250953A (en) * | 1989-03-23 | 1990-10-08 | Toppan Printing Co Ltd | Production of vapor deposited film |
| US6191399B1 (en) | 2000-02-01 | 2001-02-20 | Asm America, Inc. | System of controlling the temperature of a processing chamber |
| US6507007B2 (en) | 2000-02-01 | 2003-01-14 | Asm America, Inc. | System of controlling the temperature of a processing chamber |
| US7173216B2 (en) | 2002-08-09 | 2007-02-06 | Asm America, Inc. | LED heat lamp arrays for CVD heating |
| JP2016084494A (en) * | 2014-10-24 | 2016-05-19 | 東レフィルム加工株式会社 | Thin film deposition apparatus, and thin film deposition method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0646456B2 (en) | 1994-06-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |