GB869397A - Method and apparatus for filming articles by vacuum deposition - Google Patents

Method and apparatus for filming articles by vacuum deposition

Info

Publication number
GB869397A
GB869397A GB22167/59A GB2216759A GB869397A GB 869397 A GB869397 A GB 869397A GB 22167/59 A GB22167/59 A GB 22167/59A GB 2216759 A GB2216759 A GB 2216759A GB 869397 A GB869397 A GB 869397A
Authority
GB
United Kingdom
Prior art keywords
chamber
sheets
discharge
cleaning
intake
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22167/59A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Libbey Owens Ford Glass Co
Original Assignee
Libbey Owens Ford Glass Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Glass Co filed Critical Libbey Owens Ford Glass Co
Publication of GB869397A publication Critical patent/GB869397A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations

Abstract

869,397. Coating by vapour deposition. LIBBEY-OWENS-FORD GLASS CO. June 29, 1959 [July 2, 1958], No. 22167/59. Class 82(2) Sheets are coated by vapour deposition in an evacuated chamber by sealing a sheet in an intake chamber, simultaneously evacuating said intake chamber and cleaning a side of the sheet to be coated transferring the sheet through an opened communication to the coating chamber, closing the communication, coating the sheet while evacuating a discharge chamber, transferring the coated sheet through an opened communication to the evacuated discharge chamber, closing the communication, bringing the discharge chamber up to atmospheric pressure, and removing the coated sheet therefrom. The sheets may be glass, metal, or plastic. As shown, sheets 48 of glass in carriers 49 move successively into positions F, E, D, C, B, and A in intake chamber 21, cleaning chamber 22, coating chamber 23, and discharge chamber 24. When intake chamber 21 is empty, valve 26 is opened to the atmosphere, and the chamber supplied with dry air from dryer 25 to prevent the ingress of moisture. Fresh sheets 48 are charged, valve 26 closed, and vacuum pump 28 begins to reduce the pressure in the chamber. During the first portion of the evacuation dust free air is directed from guns 29 on the surface of the glass and dust collected at 30. Plutonium probes 31 prevent the formation of a static charge on the glass which may be heated meanwhile by heaters 32. When chamber 21 reaches a pressure of 10<SP>-3</SP> mm. Hg, valve 27 is opened and the sheets are advanced to position E in cleaning chamber 22 where they are further heated by heaters 33. At position D the sheets are glow discharge cleaned in a confined inner chamber 34 by a glow plate 35, the vacuum in the chamber being reduced while cleaning from 10<SP>-4</SP> mm. Hg to 1-10 microns Hg by introducing oxygen through pipe 37. In positions C and B the sheets are moved to at least 40 inches from evaporant sources 39 and 40 which are screened from each other by baffle 41. The vacuum chamber 23 is maintained at 10<SP>-5</SP> mm. Hg by pump 43. The coated sheets pass through valve 45 to discharge chamber 24 from which they can pass via valve 46 and out of the apparatus. A modification discloses the intake, cleaning, and discharge chambers made equal in width to the vacuum chamber (Fig. 7 not shown) so that it is unnecessary to provide equipment for moving the carriers away from and towards the centre line in the vacuum chamber. In another modification (Fig. 8 not shown) parallel pairs of intake, cleaning, and discharge chambers are used to overcome the same problem while, in a further embodiment (Fig. 9 not shown) a modified vacuum chamber is used in which evaporant sources 39 and 40 are adjacent the outer walls of the chamber so that the carriers are able to travel through each chamber without diversion from a straight line path.
GB22167/59A 1958-07-02 1959-06-29 Method and apparatus for filming articles by vacuum deposition Expired GB869397A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US869397XA 1958-07-02 1958-07-02

Publications (1)

Publication Number Publication Date
GB869397A true GB869397A (en) 1961-05-31

Family

ID=22201871

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22167/59A Expired GB869397A (en) 1958-07-02 1959-06-29 Method and apparatus for filming articles by vacuum deposition

Country Status (1)

Country Link
GB (1) GB869397A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512320A (en) * 1993-01-28 1996-04-30 Applied Materials, Inc. Vacuum processing apparatus having improved throughput
WO2001011109A1 (en) * 1999-08-04 2001-02-15 General Electric Company Electron beam physical vapor deposition apparatus
EP1221496A1 (en) * 2001-01-05 2002-07-10 Carl Zeiss Semiconductor Manufacturing Technologies Ag Method and apparatus for production of optical elements

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512320A (en) * 1993-01-28 1996-04-30 Applied Materials, Inc. Vacuum processing apparatus having improved throughput
WO2001011109A1 (en) * 1999-08-04 2001-02-15 General Electric Company Electron beam physical vapor deposition apparatus
EP1221496A1 (en) * 2001-01-05 2002-07-10 Carl Zeiss Semiconductor Manufacturing Technologies Ag Method and apparatus for production of optical elements

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