JPS6411973A - In-line type film forming device - Google Patents

Abstract

PURPOSE:To improve the efficiency of the title device in the formation of a thin film and to uniformize the quality of the film by providing the degasification chamber and isolation chamber capable of stocking plural materials to be treated between the charging chamber and film forming chamber in the in-line type film forming device. CONSTITUTION:The in-line type film forming device capable of forming a thin film on the surface of a substrate in its vacuum chamber by sputtering, etc., is composed of the charging chamber 2, the degasification chamber 6, the isolation chamber 8, a vacuum film forming chamber 10, and a discharge chamber 13. The substrate 1 to be treated is placed in the charging chamber 2 which is then closed and evacuated to remove the gases inherent in the material of plastics, etc., to be treated, then plural materials 1 to be treated are stocked in the stocker carriages 14 in the degasification chamber 6, and the absorbed gas is removed. The carriages are successively introduced in the degasification chamber 6 one by one, sent into the isolation chamber 8, and introduced into the film forming chamber 10 without entraining the gas separated in the degasification chamber 6. A film is formed in the chamber 10 by the vacuum deposition by a sputtering cathode 11, and discharged into the atmosphere at atmospheric pressure in the discharge chamber 13. Since the substrate 1 is degasified in the degasification chamber 6 for relatively long and specified time, a homogeneous then film can be efficiently formed on the whole surface of the material to be treated.