JPS565975A - Film forming method - Google Patents

Film forming method

Info

Publication number
JPS565975A
JPS565975A JP8209479A JP8209479A JPS565975A JP S565975 A JPS565975 A JP S565975A JP 8209479 A JP8209479 A JP 8209479A JP 8209479 A JP8209479 A JP 8209479A JP S565975 A JPS565975 A JP S565975A
Authority
JP
Japan
Prior art keywords
film
supporter
electrode
deposition chamber
evacuatable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8209479A
Other languages
Japanese (ja)
Other versions
JPS6357503B2 (en
Inventor
Tadaharu Fukuda
Kyosuke Ogawa
Nobuo Kitajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP8209479A priority Critical patent/JPS565975A/en
Publication of JPS565975A publication Critical patent/JPS565975A/en
Publication of JPS6357503B2 publication Critical patent/JPS6357503B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a uniform film by covering the surface of one of a pair of discharge electrodes in an evacuatable deposition chamber with a supporter and the surface of the other with a movable electrode protecting menas to prevent pollution of a film to be formed on the whole surface of the supporter. CONSTITUTION:Electrodes are prevented from being polluted by a reactive substance as a film forming material to make the physical characteristics and thickness of a film of large area uniform. For example, evacuatable deposition chamber 1 is internally provided with each side electrode 10, beltlike member 13 as electrode 10 protecting means, other electrode 9, film forming supporter 12 covering electrode 9, heater 19, feed gas introducing pipe 20 and exhaust pipe 21. On the other hand, evacuatable non-deposition chamber 2 is internally provided with drums 14, 15 for driving supporter 12, plate 16 for peeling a film on member 13 and driving rollers 18. Both chambers 1, 2 are evacuated to a predetermined vacuum degree, a reactive gas is supplied, and discharge is induced between electrodes 9, 10 to form a film on moving supporter 12. At the same time, member 13 is moved to peel the film substance stuck onto member 13 with plate 16, thereby preventing pollution of supporter 12.
JP8209479A 1979-06-27 1979-06-27 Film forming method Granted JPS565975A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8209479A JPS565975A (en) 1979-06-27 1979-06-27 Film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8209479A JPS565975A (en) 1979-06-27 1979-06-27 Film forming method

Publications (2)

Publication Number Publication Date
JPS565975A true JPS565975A (en) 1981-01-22
JPS6357503B2 JPS6357503B2 (en) 1988-11-11

Family

ID=13764834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8209479A Granted JPS565975A (en) 1979-06-27 1979-06-27 Film forming method

Country Status (1)

Country Link
JP (1) JPS565975A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100671A (en) * 1981-12-11 1983-06-15 Canon Inc Plasma cvd device provided with capturing device for fine powder
JPS60128263A (en) * 1983-12-14 1985-07-09 Canon Inc Formation of deposited film
JPH05569U (en) * 1991-06-21 1993-01-08 昭和飛行機工業株式会社 Door for truck
JP2002126504A (en) * 2000-10-20 2002-05-08 Toray Ind Inc Method for producing base material having thin film
NL1023072C2 (en) * 2003-04-01 2004-10-04 Tno Method and system for generating a plasma.
US7647887B2 (en) * 2003-03-31 2010-01-19 Konica Minolta Holdings, Inc. Thin film forming apparatus
US20130084409A1 (en) * 2010-07-09 2013-04-04 Vito Nv Method and Device for Atmospheric Pressure Plasma Treatment

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58100671A (en) * 1981-12-11 1983-06-15 Canon Inc Plasma cvd device provided with capturing device for fine powder
JPS60128263A (en) * 1983-12-14 1985-07-09 Canon Inc Formation of deposited film
JPH05569U (en) * 1991-06-21 1993-01-08 昭和飛行機工業株式会社 Door for truck
JP2002126504A (en) * 2000-10-20 2002-05-08 Toray Ind Inc Method for producing base material having thin film
JP4604331B2 (en) * 2000-10-20 2011-01-05 東レ株式会社 Manufacturing method of substrate with thin film
US7647887B2 (en) * 2003-03-31 2010-01-19 Konica Minolta Holdings, Inc. Thin film forming apparatus
NL1023072C2 (en) * 2003-04-01 2004-10-04 Tno Method and system for generating a plasma.
WO2004088711A3 (en) * 2003-04-01 2005-11-17 Tno Method and system for generating a plasma
US20130084409A1 (en) * 2010-07-09 2013-04-04 Vito Nv Method and Device for Atmospheric Pressure Plasma Treatment
US9255330B2 (en) * 2010-07-09 2016-02-09 Vito Nv Method and device for atmospheric pressure plasma treatment

Also Published As

Publication number Publication date
JPS6357503B2 (en) 1988-11-11

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