WO2004088711A3 - Method and system for generating a plasma - Google Patents

Method and system for generating a plasma Download PDF

Info

Publication number
WO2004088711A3
WO2004088711A3 PCT/NL2004/000220 NL2004000220W WO2004088711A3 WO 2004088711 A3 WO2004088711 A3 WO 2004088711A3 NL 2004000220 W NL2004000220 W NL 2004000220W WO 2004088711 A3 WO2004088711 A3 WO 2004088711A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
protective layer
electrodes
film
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/NL2004/000220
Other languages
French (fr)
Dutch (nl)
Other versions
WO2004088711A2 (en
Inventor
Goeje Marius Pieter De
Heck Gerardus Titus Van
Johannes Petrus Zijp
Yves Lodewijk Maria Creijghton
Mol Antonius Maria Bernard Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Original Assignee
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO filed Critical Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Publication of WO2004088711A2 publication Critical patent/WO2004088711A2/en
Anticipated expiration legal-status Critical
Publication of WO2004088711A3 publication Critical patent/WO2004088711A3/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)

Abstract

A method and system respectively for generating plasma (8) between electrodes (1, 2) separated by a gaseous or vaporous dielectric, to which a voltage source has been connected. In order to prevent flashover, the electrodes may be provided with a solid dielectric (3, 4). Pollution and/or ageing of the electrode protective layer can successfully be prevented by regularly 'changing' this protective layer by means of a movable protective layer (5, 9) which is moved over or along the respective electrode, through the area in which the plasma is generated. When the plasma is used for treating a film-shaped base material (coating, etching, etc.) this film can at the same time be used as movable electrode shielding.
PCT/NL2004/000220 2003-04-01 2004-04-01 Method and system for generating a plasma Ceased WO2004088711A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1023072A NL1023072C2 (en) 2003-04-01 2003-04-01 Method and system for generating a plasma.
NL1023072 2003-04-01

Publications (2)

Publication Number Publication Date
WO2004088711A2 WO2004088711A2 (en) 2004-10-14
WO2004088711A3 true WO2004088711A3 (en) 2005-11-17

Family

ID=33129150

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NL2004/000220 Ceased WO2004088711A2 (en) 2003-04-01 2004-04-01 Method and system for generating a plasma

Country Status (2)

Country Link
NL (1) NL1023072C2 (en)
WO (1) WO2004088711A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1938907A1 (en) * 2006-12-28 2008-07-02 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Deposition of particles on a substrate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB573699A (en) * 1943-09-02 1945-12-03 Univ Texas Apparatus for treating gases with electric glow discharges
JPS565975A (en) * 1979-06-27 1981-01-22 Canon Inc Film forming method
US5637358A (en) * 1988-12-28 1997-06-10 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet
EP1073091A2 (en) * 1999-07-27 2001-01-31 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB573699A (en) * 1943-09-02 1945-12-03 Univ Texas Apparatus for treating gases with electric glow discharges
JPS565975A (en) * 1979-06-27 1981-01-22 Canon Inc Film forming method
US5637358A (en) * 1988-12-28 1997-06-10 Canon Kabushiki Kaisha Microwave plasma chemical vapor deposition process using a microwave window and movable, dielectric sheet
EP1073091A2 (en) * 1999-07-27 2001-01-31 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 0050, no. 54 (C - 050) 15 April 1981 (1981-04-15) *

Also Published As

Publication number Publication date
WO2004088711A2 (en) 2004-10-14
NL1023072C2 (en) 2004-10-04

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