JPS5742331A - Manufacture for deposited film - Google Patents

Manufacture for deposited film

Info

Publication number
JPS5742331A
JPS5742331A JP11737180A JP11737180A JPS5742331A JP S5742331 A JPS5742331 A JP S5742331A JP 11737180 A JP11737180 A JP 11737180A JP 11737180 A JP11737180 A JP 11737180A JP S5742331 A JPS5742331 A JP S5742331A
Authority
JP
Japan
Prior art keywords
film
substrate
deposited
heater
power source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11737180A
Other languages
Japanese (ja)
Other versions
JPS6319210B2 (en
Inventor
Junichiro Kanbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11737180A priority Critical patent/JPS5742331A/en
Publication of JPS5742331A publication Critical patent/JPS5742331A/en
Publication of JPS6319210B2 publication Critical patent/JPS6319210B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Abstract

PURPOSE:To deposite a film of high quality onto a substrate at a high speed by a method wherein a gaseous material introduced into an evacuated vessel is decomposed by both electric discharge energy and heat energy. CONSTITUTION:The gaseous material such as SiH4, Si2H6 or the like for depositing a film is introduced into a deposition chamber 101 evacuated to a predetermined degree of vacuum, and after heating the substrate 105 by a heating means 107, a high- frequency power source 103 and a power source 109 for a heater 108 are turned ON. Then, a glow discharge is induced between electrodes 104-1, 104-2 to form an atmosphere of a plasma, which is further heated by the heater 108. When a film is deposited on the substrate 105 by this method, the film uniform and excellent quality and can be deposited at a high speed.
JP11737180A 1980-08-26 1980-08-26 Manufacture for deposited film Granted JPS5742331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11737180A JPS5742331A (en) 1980-08-26 1980-08-26 Manufacture for deposited film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11737180A JPS5742331A (en) 1980-08-26 1980-08-26 Manufacture for deposited film

Publications (2)

Publication Number Publication Date
JPS5742331A true JPS5742331A (en) 1982-03-09
JPS6319210B2 JPS6319210B2 (en) 1988-04-21

Family

ID=14709996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11737180A Granted JPS5742331A (en) 1980-08-26 1980-08-26 Manufacture for deposited film

Country Status (1)

Country Link
JP (1) JPS5742331A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60104955A (en) * 1983-11-11 1985-06-10 Hitachi Koki Co Ltd Electrophotographic image forming member
JPH02222853A (en) * 1988-10-08 1990-09-05 Honda Motor Co Ltd Ultrasonic radar

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5578524A (en) * 1978-12-10 1980-06-13 Shunpei Yamazaki Manufacture of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5578524A (en) * 1978-12-10 1980-06-13 Shunpei Yamazaki Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60104955A (en) * 1983-11-11 1985-06-10 Hitachi Koki Co Ltd Electrophotographic image forming member
JPH02222853A (en) * 1988-10-08 1990-09-05 Honda Motor Co Ltd Ultrasonic radar

Also Published As

Publication number Publication date
JPS6319210B2 (en) 1988-04-21

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