JPS5526613A - Manufacturing of carrier tape useful for ic - Google Patents

Manufacturing of carrier tape useful for ic

Info

Publication number
JPS5526613A
JPS5526613A JP9853178A JP9853178A JPS5526613A JP S5526613 A JPS5526613 A JP S5526613A JP 9853178 A JP9853178 A JP 9853178A JP 9853178 A JP9853178 A JP 9853178A JP S5526613 A JPS5526613 A JP S5526613A
Authority
JP
Japan
Prior art keywords
foil
bump
areas
area
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9853178A
Other languages
Japanese (ja)
Inventor
Mitsumasa Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP9853178A priority Critical patent/JPS5526613A/en
Publication of JPS5526613A publication Critical patent/JPS5526613A/en
Pending legal-status Critical Current

Links

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE: To provide a novel carrier tape in which the conductor pattern-forming areas and foil-preserving areas on the upper surface of a conductor foil and the bump-forming areas and foil-preserving areas on the back surface of the same conductor foil are covered with resist; only the upper surface is etched to half depth, while exposed areas are etched off, so that bumps are intergrally formed on the side opposite to the patterns.
CONSTITUTION: Conductor foil tape 1 is coated with photoresist 3. Patterns are sticked on the coated surface, followed by development. From the upper surface of foil 1, resist 4 corresponding to the area where the pattern would not be formed within a device hole is removed, while from the back surface of foil 1, resist 5 corresponding to the area where the bump would not be formed within the device hole is removed. Then both the upper and the back of the tape are subjected to suimultaneous ething, producing an ethed area 8 having a thickness necessary for the formation of bumps. Thus a bump-forming area 6 and the exterion of the device hole 9 have the same thickness as foil 1. All resists remaining unremoved are then peeled off. The resultant composite is tin-plated to finish a film-less and bump- provided IC carrier tape, which, having no organic films to cover but having excellent electrical and mechanical properties, is highly resistant to heat.
COPYRIGHT: (C)1980,JPO&Japio
JP9853178A 1978-08-11 1978-08-11 Manufacturing of carrier tape useful for ic Pending JPS5526613A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9853178A JPS5526613A (en) 1978-08-11 1978-08-11 Manufacturing of carrier tape useful for ic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9853178A JPS5526613A (en) 1978-08-11 1978-08-11 Manufacturing of carrier tape useful for ic

Publications (1)

Publication Number Publication Date
JPS5526613A true JPS5526613A (en) 1980-02-26

Family

ID=14222252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9853178A Pending JPS5526613A (en) 1978-08-11 1978-08-11 Manufacturing of carrier tape useful for ic

Country Status (1)

Country Link
JP (1) JPS5526613A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701363A (en) * 1986-01-27 1987-10-20 Olin Corporation Process for manufacturing bumped tape for tape automated bonding and the product produced thereby
US4735678A (en) * 1987-04-13 1988-04-05 Olin Corporation Forming a circuit pattern in a metallic tape by electrical discharge machining
US5786239A (en) * 1995-09-20 1998-07-28 Sony Corporation Method of manufacturing a semiconductor package
US6077727A (en) * 1996-01-31 2000-06-20 Sony Corporation Method for manufacturing lead frame

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701363A (en) * 1986-01-27 1987-10-20 Olin Corporation Process for manufacturing bumped tape for tape automated bonding and the product produced thereby
US4735678A (en) * 1987-04-13 1988-04-05 Olin Corporation Forming a circuit pattern in a metallic tape by electrical discharge machining
US5786239A (en) * 1995-09-20 1998-07-28 Sony Corporation Method of manufacturing a semiconductor package
US6077727A (en) * 1996-01-31 2000-06-20 Sony Corporation Method for manufacturing lead frame

Similar Documents

Publication Publication Date Title
ES483987A1 (en) Fabrication of integrated circuits utilizing thick high-resolution patterns
EP0304077A3 (en) Method of forming a fine pattern
JPS5526613A (en) Manufacturing of carrier tape useful for ic
JPS52142740A (en) Method of formation of shaped pattern using paper pattern having air-permeable formed layer
JPS5526612A (en) Manufacturing of carrier tape useful for ic
JPS5374392A (en) Multi-layer coat formation method
JPS5618446A (en) Formation of spherical salient electrode
JPS52124884A (en) Production of semiconductor device
JPS568834A (en) Manufacture of projection for substrate conductor layer
JPS5384693A (en) Production of semiconductor device
JPS54158183A (en) Manufacture of semiconductor device
JPS53142337A (en) Manufacture of copper through hole plate
JPS5516553A (en) Maunfacture of small and plane-shaped coil
JPS54113277A (en) Production of semiconductor device
JPS54135627A (en) Metal face decorated plate
JPS53124993A (en) Production of semiconductor device
JPS5386165A (en) Production of semiconductor device
JPS54134036A (en) Manufacture of perforated plated product
ES2006071A6 (en) Cladding of substrates with thick metal circuit patterns
JPS5291193A (en) Forming method of conductor pattern
JPS53119228A (en) Production of perforated plated metal foil
JPS5614101A (en) Pattern checking method
JPS6480097A (en) Manufacture of printed wiring board
JPS5430782A (en) Forming method of pattern
JPS544575A (en) Production of semiconductor devices