JPS55153334A - Manufacture of integrated element - Google Patents

Manufacture of integrated element

Info

Publication number
JPS55153334A
JPS55153334A JP6199179A JP6199179A JPS55153334A JP S55153334 A JPS55153334 A JP S55153334A JP 6199179 A JP6199179 A JP 6199179A JP 6199179 A JP6199179 A JP 6199179A JP S55153334 A JPS55153334 A JP S55153334A
Authority
JP
Japan
Prior art keywords
mark
reference mark
flash
electron beam
setting reference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6199179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6210009B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6199179A priority Critical patent/JPS55153334A/ja
Publication of JPS55153334A publication Critical patent/JPS55153334A/ja
Publication of JPS6210009B2 publication Critical patent/JPS6210009B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
JP6199179A 1979-05-18 1979-05-18 Manufacture of integrated element Granted JPS55153334A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6199179A JPS55153334A (en) 1979-05-18 1979-05-18 Manufacture of integrated element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6199179A JPS55153334A (en) 1979-05-18 1979-05-18 Manufacture of integrated element

Publications (2)

Publication Number Publication Date
JPS55153334A true JPS55153334A (en) 1980-11-29
JPS6210009B2 JPS6210009B2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=13187163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6199179A Granted JPS55153334A (en) 1979-05-18 1979-05-18 Manufacture of integrated element

Country Status (1)

Country Link
JP (1) JPS55153334A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261407U (enrdf_load_stackoverflow) * 1988-10-24 1990-05-08
JPH0670813U (ja) * 1993-03-16 1994-10-04 鐘紡株式会社 フィルターハウジング

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456814A (en) * 1977-10-14 1979-05-08 Nippon Gakki Seizo Kk Electronic musical instrument

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5456814A (en) * 1977-10-14 1979-05-08 Nippon Gakki Seizo Kk Electronic musical instrument

Also Published As

Publication number Publication date
JPS6210009B2 (enrdf_load_stackoverflow) 1987-03-04

Similar Documents

Publication Publication Date Title
JPS55153334A (en) Manufacture of integrated element
JPS5255869A (en) Production of semiconductor device
JPS5352072A (en) Pattern for alignment
JPS5656632A (en) Manufacture of semiconductor element
JPS5376757A (en) Photoetching method
JPS5251874A (en) Electron beam exposure device
JPS52139377A (en) Production of semiconductor device
JPS55165637A (en) Manufacture of semiconductor integrated circuit
JPS564238A (en) Forming of pattern
JPS5679428A (en) Working of ultra-fine article
JPS57176040A (en) Preparation of photomask
JPS5353263A (en) Manufacture of semiconductor element
JPS5412265A (en) Production of semiconductor elements
JPS5255381A (en) Photo exposure method
JPS5673435A (en) Manufacture of semiconductor device
JPS5678122A (en) Formation of pattern
JPS5779670A (en) Manufacture of semiconductor device
JPS54144177A (en) Manufacturing mask for semiconductor device
JPS5452473A (en) Forming method for coating for fine pattern
JPS5555528A (en) Mask aligner
JPS55156328A (en) Manufacture for integrated element
JPS52120770A (en) Thin film formation method
JPS52135675A (en) Anisotropic ethcing of semiconductor single crystal
SE411131B (sv) Litografisk tryckplat med aluminiumunderlag och ett porost anodoxidskikt pa underlaget samt forfarande for dess framstellning
JPS53144678A (en) Production of electron beam mask