JPS55148426A - Electron beam position detecting method - Google Patents

Electron beam position detecting method

Info

Publication number
JPS55148426A
JPS55148426A JP5681479A JP5681479A JPS55148426A JP S55148426 A JPS55148426 A JP S55148426A JP 5681479 A JP5681479 A JP 5681479A JP 5681479 A JP5681479 A JP 5681479A JP S55148426 A JPS55148426 A JP S55148426A
Authority
JP
Japan
Prior art keywords
resist
etching
mark
electrode beam
permalloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5681479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6210008B2 (enrdf_load_stackoverflow
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5681479A priority Critical patent/JPS55148426A/ja
Publication of JPS55148426A publication Critical patent/JPS55148426A/ja
Publication of JPS6210008B2 publication Critical patent/JPS6210008B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP5681479A 1979-05-09 1979-05-09 Electron beam position detecting method Granted JPS55148426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5681479A JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5681479A JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Publications (2)

Publication Number Publication Date
JPS55148426A true JPS55148426A (en) 1980-11-19
JPS6210008B2 JPS6210008B2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=13037837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5681479A Granted JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Country Status (1)

Country Link
JP (1) JPS55148426A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6210008B2 (enrdf_load_stackoverflow) 1987-03-04

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