JPS6210008B2 - - Google Patents

Info

Publication number
JPS6210008B2
JPS6210008B2 JP5681479A JP5681479A JPS6210008B2 JP S6210008 B2 JPS6210008 B2 JP S6210008B2 JP 5681479 A JP5681479 A JP 5681479A JP 5681479 A JP5681479 A JP 5681479A JP S6210008 B2 JPS6210008 B2 JP S6210008B2
Authority
JP
Japan
Prior art keywords
mark
electron beam
position detection
detection signal
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5681479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55148426A (en
Inventor
Masaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5681479A priority Critical patent/JPS55148426A/ja
Publication of JPS55148426A publication Critical patent/JPS55148426A/ja
Publication of JPS6210008B2 publication Critical patent/JPS6210008B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP5681479A 1979-05-09 1979-05-09 Electron beam position detecting method Granted JPS55148426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5681479A JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5681479A JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Publications (2)

Publication Number Publication Date
JPS55148426A JPS55148426A (en) 1980-11-19
JPS6210008B2 true JPS6210008B2 (enrdf_load_stackoverflow) 1987-03-04

Family

ID=13037837

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5681479A Granted JPS55148426A (en) 1979-05-09 1979-05-09 Electron beam position detecting method

Country Status (1)

Country Link
JP (1) JPS55148426A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS55148426A (en) 1980-11-19

Similar Documents

Publication Publication Date Title
JP2723508B2 (ja) 電子線直接描画のためのアライメント方法
JP2766576B2 (ja) アライメント方法
US4797334A (en) Patterning optical and X-ray masks for integrated circuit fabrication
JPS6210008B2 (enrdf_load_stackoverflow)
JP3051099B2 (ja) マーク基板，マーク基板の製造方法，電子ビーム描画装置及び電子ビーム描画装置の光学系の調整方法
JP2994306B2 (ja) 光リソグラフィおよび電子ビーム・リソグラフィを用いたｘ線マスクの高精度製作方法
JPS5885532A (ja) 電子ビ−ムによる位置決め方法
JPS6227728B2 (enrdf_load_stackoverflow)
JPS6232612B2 (enrdf_load_stackoverflow)
JPH03209711A (ja) 半導体装置の製造方法
JPS6210009B2 (enrdf_load_stackoverflow)
JPS6210011B2 (enrdf_load_stackoverflow)
JPS6154247B2 (enrdf_load_stackoverflow)
JPH0121616B2 (enrdf_load_stackoverflow)
JPS6142409B2 (enrdf_load_stackoverflow)
JPH0425113A (ja) マーカー形成方法
JPS58199525A (ja) Ｘ線用マスク
JPH05241350A (ja) レジストパターン形成方法
JPS6111461B2 (enrdf_load_stackoverflow)
JP2004077808A (ja) 位相シフトレチクルの製造方法
JPH0297950A (ja) レジストパターン形成方法
JPH04102851A (ja) レチクル
JPS6252850B2 (enrdf_load_stackoverflow)
JPS59161024A (ja) 位置合せマ−クの形成方法
JPH07111231A (ja) 半導体装置およびその製造方法