JPH0121616B2 - - Google Patents
Info
- Publication number
- JPH0121616B2 JPH0121616B2 JP6547379A JP6547379A JPH0121616B2 JP H0121616 B2 JPH0121616 B2 JP H0121616B2 JP 6547379 A JP6547379 A JP 6547379A JP 6547379 A JP6547379 A JP 6547379A JP H0121616 B2 JPH0121616 B2 JP H0121616B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- electron beam
- warpage
- points
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 42
- 238000010894 electron beam technology Methods 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 7
- 238000000609 electron-beam lithography Methods 0.000 claims description 7
- 238000001459 lithography Methods 0.000 claims 1
- 238000004904 shortening Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 63
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6547379A JPS55157231A (en) | 1979-05-25 | 1979-05-25 | Method of forming pattern by electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6547379A JPS55157231A (en) | 1979-05-25 | 1979-05-25 | Method of forming pattern by electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55157231A JPS55157231A (en) | 1980-12-06 |
| JPH0121616B2 true JPH0121616B2 (enrdf_load_stackoverflow) | 1989-04-21 |
Family
ID=13288105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6547379A Granted JPS55157231A (en) | 1979-05-25 | 1979-05-25 | Method of forming pattern by electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55157231A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62159425A (ja) * | 1986-01-08 | 1987-07-15 | Toshiba Mach Co Ltd | 荷電ビ−ム描画方法 |
| KR100319898B1 (ko) * | 2000-03-20 | 2002-01-10 | 윤종용 | 웨이퍼의 치수인자 측정방법 및 그 장치 |
| KR100461024B1 (ko) * | 2002-04-15 | 2004-12-13 | 주식회사 이오테크닉스 | 칩 스케일 마커 및 마킹 방법 |
-
1979
- 1979-05-25 JP JP6547379A patent/JPS55157231A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55157231A (en) | 1980-12-06 |