JPS5254377A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS5254377A
JPS5254377A JP12985775A JP12985775A JPS5254377A JP S5254377 A JPS5254377 A JP S5254377A JP 12985775 A JP12985775 A JP 12985775A JP 12985775 A JP12985775 A JP 12985775A JP S5254377 A JPS5254377 A JP S5254377A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
semiconductor substrate
stepping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12985775A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Yasuo Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12985775A priority Critical patent/JPS5254377A/en
Publication of JPS5254377A publication Critical patent/JPS5254377A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To improve the working accuracy for patterns by controlling the exposure quantity of electron beams by the memory having stored the information on the stepping shape and the thickness of the resist film coated on a semiconductor substrate when there is the stepping on said semiconductor substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP12985775A 1975-10-30 1975-10-30 Electron beam exposure method Pending JPS5254377A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12985775A JPS5254377A (en) 1975-10-30 1975-10-30 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12985775A JPS5254377A (en) 1975-10-30 1975-10-30 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS5254377A true JPS5254377A (en) 1977-05-02

Family

ID=15019971

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12985775A Pending JPS5254377A (en) 1975-10-30 1975-10-30 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS5254377A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS5648135A (en) * 1979-09-28 1981-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Painting for electron beam and device therefor
JPS61105837A (en) * 1984-10-29 1986-05-23 Toshiba Corp Electron beam exposure method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580318A (en) * 1978-12-12 1980-06-17 Fujitsu Ltd Electron-beam exposure
JPS5648135A (en) * 1979-09-28 1981-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Painting for electron beam and device therefor
JPS61105837A (en) * 1984-10-29 1986-05-23 Toshiba Corp Electron beam exposure method

Similar Documents

Publication Publication Date Title
GB1500606A (en) Electron beam positive resist
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS5254377A (en) Electron beam exposure method
JPS52119172A (en) Forming method of fine pattern
JPS5791523A (en) Manufacture of semiconductor device
JPS52139374A (en) Alignment pattern forming method for mask alignment
JPS5376757A (en) Photoetching method
JPS52173A (en) X-ray etching mask
JPS5421271A (en) Pattern forming method
JPS5318969A (en) Wafer fixing method
JPS51120671A (en) Photomask fault processing method
JPS5251874A (en) Electron beam exposure device
JPS5556629A (en) Pattern forming method
JPS52117077A (en) Electron beam-exposing method
JPS5359374A (en) Electron beam exposure unit
JPS5211868A (en) Photoresist coating method
JPS5318964A (en) X-ray projection and exposure system
JPS5347825A (en) Photoresist exposure
JPS5277671A (en) Method and equipment of masking
JPS5244571A (en) Method of forming fine pattern
JPS52119079A (en) Electron beam exposure
JPS52111382A (en) Photo-mask producing for semi-conductor
JPS53114676A (en) Electron beam exposure method
JPS52119179A (en) Electron beam exposing method
JPS5384478A (en) Forming method for micropattern