JPS55143560A - Manufacture of photomask - Google Patents

Manufacture of photomask

Info

Publication number
JPS55143560A
JPS55143560A JP5182479A JP5182479A JPS55143560A JP S55143560 A JPS55143560 A JP S55143560A JP 5182479 A JP5182479 A JP 5182479A JP 5182479 A JP5182479 A JP 5182479A JP S55143560 A JPS55143560 A JP S55143560A
Authority
JP
Japan
Prior art keywords
film
etching
pattern
lsi
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5182479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62493B2 (enrdf_load_stackoverflow
Inventor
Teruhiko Yamazaki
Yoshimare Suzuki
Jun Uno
Yaichiro Watakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP5182479A priority Critical patent/JPS55143560A/ja
Publication of JPS55143560A publication Critical patent/JPS55143560A/ja
Publication of JPS62493B2 publication Critical patent/JPS62493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP5182479A 1979-04-26 1979-04-26 Manufacture of photomask Granted JPS55143560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5182479A JPS55143560A (en) 1979-04-26 1979-04-26 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5182479A JPS55143560A (en) 1979-04-26 1979-04-26 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS55143560A true JPS55143560A (en) 1980-11-08
JPS62493B2 JPS62493B2 (enrdf_load_stackoverflow) 1987-01-08

Family

ID=12897630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5182479A Granted JPS55143560A (en) 1979-04-26 1979-04-26 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS55143560A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144245A (en) * 1979-04-27 1980-11-11 Mitsubishi Electric Corp Manufacture of photomask
US5302236A (en) * 1990-10-19 1994-04-12 Tokyo Electron Limited Method of etching object to be processed including oxide or nitride portion
US6309976B1 (en) * 1999-03-22 2001-10-30 Taiwan Semiconductor Manufacturing Company Critical dimension controlled method of plasma descum for conventional quarter micron and smaller dimension binary mask manufacture
DE10146935A1 (de) * 2001-09-24 2003-04-17 Infineon Technologies Ag Verfahren zum Herstellen einer Fotomaske

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55144245A (en) * 1979-04-27 1980-11-11 Mitsubishi Electric Corp Manufacture of photomask
US5302236A (en) * 1990-10-19 1994-04-12 Tokyo Electron Limited Method of etching object to be processed including oxide or nitride portion
US6309976B1 (en) * 1999-03-22 2001-10-30 Taiwan Semiconductor Manufacturing Company Critical dimension controlled method of plasma descum for conventional quarter micron and smaller dimension binary mask manufacture
DE10146935A1 (de) * 2001-09-24 2003-04-17 Infineon Technologies Ag Verfahren zum Herstellen einer Fotomaske

Also Published As

Publication number Publication date
JPS62493B2 (enrdf_load_stackoverflow) 1987-01-08

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