JPS55141747A - Thin film element - Google Patents

Thin film element

Info

Publication number
JPS55141747A
JPS55141747A JP4797379A JP4797379A JPS55141747A JP S55141747 A JPS55141747 A JP S55141747A JP 4797379 A JP4797379 A JP 4797379A JP 4797379 A JP4797379 A JP 4797379A JP S55141747 A JPS55141747 A JP S55141747A
Authority
JP
Japan
Prior art keywords
basic pattern
thin film
resist
film element
arcuate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4797379A
Other languages
Japanese (ja)
Inventor
Mitsugi Saida
Kaoru Takeya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4797379A priority Critical patent/JPS55141747A/en
Publication of JPS55141747A publication Critical patent/JPS55141747A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/01—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
    • H01L27/016—Thin-film circuits

Abstract

PURPOSE:To fabricate a thin film element having preferable workability by photoetching several times to form a substrate pattern on a glazed ceramic substrate so as to form arcuate steps at both ends of the basic pattern and forming a forming resist thereon. CONSTITUTION:A basic pattern resist 11 is formed on a glazed ceramic substrate 1, and a basic pattern 13 is formed thereon by etching process. Then, a basic pattern resist 12 having slightly narrower than the basic pattern 13 is formed thereon and so etched that the wide surface of the basic pattern 13 is slightly retained. Thus, the basic pattern 13 is formed with arcuate steps 9 at both right and left side ends thereof, and the resultant steps 9 which are continuously etched at the edges may become arcuate. When a forming resist 8 is formed on the basic pattern 13' of this shape, there can be obtained a thin film element in which no gap is formed but it is formed integral.
JP4797379A 1979-04-20 1979-04-20 Thin film element Pending JPS55141747A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4797379A JPS55141747A (en) 1979-04-20 1979-04-20 Thin film element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4797379A JPS55141747A (en) 1979-04-20 1979-04-20 Thin film element

Publications (1)

Publication Number Publication Date
JPS55141747A true JPS55141747A (en) 1980-11-05

Family

ID=12790251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4797379A Pending JPS55141747A (en) 1979-04-20 1979-04-20 Thin film element

Country Status (1)

Country Link
JP (1) JPS55141747A (en)

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