JPS55134976A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS55134976A JPS55134976A JP4280179A JP4280179A JPS55134976A JP S55134976 A JPS55134976 A JP S55134976A JP 4280179 A JP4280179 A JP 4280179A JP 4280179 A JP4280179 A JP 4280179A JP S55134976 A JPS55134976 A JP S55134976A
- Authority
- JP
- Japan
- Prior art keywords
- resistance
- polycrystalline
- voltage resistance
- bend
- curve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 5
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0288—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using passive elements as protective elements, e.g. resistors, capacitors, inductors, spark-gaps
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Protection Of Static Devices (AREA)
- Amplifiers (AREA)
Abstract
PURPOSE:To improve electrostatic dielectric strength without changing layout of circuit, by broadening width of polycrystalline Si resistance layer at curve or bend. CONSTITUTION:Electrostatic breakdown voltage resistance of protective circuit using polycrystalline Si resistance is determined mostly by voltage resistance of the polycrystalline Si resistance itself, that is, as the polycrystalline Si's thickness, width and resistance value get larger, the voltage resistance becomes higher. On the other hand, these constants are limited by characteristics of MOSIC and the manufacturing procedure, and current is concentrated at curves or bends to excessively heat these section locally, and this is possible to give rise fusing. And therefore, by broadening widths of curve and bend 7 to make them wider than rectilinear section 3, it becomes possible to increase voltage resistance of the polycrystalline Si resistance without expanding area of IC device and therefore to improve electrostatic dielectric strength of the device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4280179A JPS55134976A (en) | 1979-04-09 | 1979-04-09 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4280179A JPS55134976A (en) | 1979-04-09 | 1979-04-09 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55134976A true JPS55134976A (en) | 1980-10-21 |
JPH0381310B2 JPH0381310B2 (en) | 1991-12-27 |
Family
ID=12646062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4280179A Granted JPS55134976A (en) | 1979-04-09 | 1979-04-09 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55134976A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01149451A (en) * | 1987-12-04 | 1989-06-12 | Rohm Co Ltd | Protective device for cmos input stage gate |
JP2002173168A (en) * | 2000-12-01 | 2002-06-18 | Seretsuku Kk | Food preservation container |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5030255U (en) * | 1973-07-13 | 1975-04-04 | ||
JPS50134387A (en) * | 1974-04-10 | 1975-10-24 | ||
JPS5429984A (en) * | 1977-08-10 | 1979-03-06 | Hitachi Ltd | Protector for semiconductor device |
-
1979
- 1979-04-09 JP JP4280179A patent/JPS55134976A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5030255U (en) * | 1973-07-13 | 1975-04-04 | ||
JPS50134387A (en) * | 1974-04-10 | 1975-10-24 | ||
JPS5429984A (en) * | 1977-08-10 | 1979-03-06 | Hitachi Ltd | Protector for semiconductor device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01149451A (en) * | 1987-12-04 | 1989-06-12 | Rohm Co Ltd | Protective device for cmos input stage gate |
JP2002173168A (en) * | 2000-12-01 | 2002-06-18 | Seretsuku Kk | Food preservation container |
Also Published As
Publication number | Publication date |
---|---|
JPH0381310B2 (en) | 1991-12-27 |
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