JPS55133887A - Electron beam radiation apparatus - Google Patents

Electron beam radiation apparatus

Info

Publication number
JPS55133887A
JPS55133887A JP4231779A JP4231779A JPS55133887A JP S55133887 A JPS55133887 A JP S55133887A JP 4231779 A JP4231779 A JP 4231779A JP 4231779 A JP4231779 A JP 4231779A JP S55133887 A JPS55133887 A JP S55133887A
Authority
JP
Japan
Prior art keywords
deflecting
electron beam
coil
correcting
control circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4231779A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6136342B2 (enrdf_load_stackoverflow
Inventor
Kazumitsu Nakamura
Soichiro Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4231779A priority Critical patent/JPS55133887A/ja
Publication of JPS55133887A publication Critical patent/JPS55133887A/ja
Publication of JPS6136342B2 publication Critical patent/JPS6136342B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Electron Sources, Ion Sources (AREA)
JP4231779A 1979-04-07 1979-04-07 Electron beam radiation apparatus Granted JPS55133887A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4231779A JPS55133887A (en) 1979-04-07 1979-04-07 Electron beam radiation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4231779A JPS55133887A (en) 1979-04-07 1979-04-07 Electron beam radiation apparatus

Publications (2)

Publication Number Publication Date
JPS55133887A true JPS55133887A (en) 1980-10-18
JPS6136342B2 JPS6136342B2 (enrdf_load_stackoverflow) 1986-08-18

Family

ID=12632631

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4231779A Granted JPS55133887A (en) 1979-04-07 1979-04-07 Electron beam radiation apparatus

Country Status (1)

Country Link
JP (1) JPS55133887A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5787131A (en) * 1980-11-20 1982-05-31 Jeol Ltd Exposing method of electron beam
JPS585955A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd 動的偏向非点の補正装置
JPS60128616A (ja) * 1983-12-16 1985-07-09 Hitachi Ltd 電子線描画装置
JPS615517A (ja) * 1984-06-19 1986-01-11 Toshiba Corp 荷電ビ−ム装置の偏向歪み補正方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5787131A (en) * 1980-11-20 1982-05-31 Jeol Ltd Exposing method of electron beam
JPS585955A (ja) * 1981-07-03 1983-01-13 Hitachi Ltd 動的偏向非点の補正装置
JPS60128616A (ja) * 1983-12-16 1985-07-09 Hitachi Ltd 電子線描画装置
JPS615517A (ja) * 1984-06-19 1986-01-11 Toshiba Corp 荷電ビ−ム装置の偏向歪み補正方法

Also Published As

Publication number Publication date
JPS6136342B2 (enrdf_load_stackoverflow) 1986-08-18

Similar Documents

Publication Publication Date Title
JPS55133887A (en) Electron beam radiation apparatus
GB1155534A (en) Magnetic Field Scanner with Inductive Voltage Divider and Spectrometer using same
GB1444737A (en) Electron beam projection systems anti-personnel projectile
JPS57210549A (en) Method of correction attendant on deflection
JPS5527781A (en) Magnetic beam adjustment method
JPH03226998A (ja) 電磁石電源装置
JPS556829A (en) Electron beam exposure method
JPS5496920A (en) Deflected linearity correcting system for braun tube
JPS5759108A (en) Mark position detecting method for electron beam exposure
JPS5645025A (en) Electron beam lithography apparatus
JPS55159670A (en) Electromagnetic deflection amplifier circuit for cathode ray tube
JPS51138286A (en) Error correction method for numeric control system
JPS54138467A (en) Scanning type electron microscope or resembling apparatus
JPS5216124A (en) Raster position and size correction unit of cathode ray tube
GB1146356A (en) Improvements in magnetic scanning circuits for electron beam tubes
ES350628A1 (es) Procedimiento de subordinacion en posicion de los haces de iones en los espectrometros de masa.
JPS5442598A (en) Plasma controlling device
JPS5693253A (en) Electron beam deflecting device
JPS57199384A (en) Registration correcting circuit for television camera
GB1211227A (en) Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target
JPS5557247A (en) Electron-ray deflecting apparatus for scan-type electron microscope
JPS5535218A (en) Test equipment for deflecting yoke
JPS5591543A (en) Electron beam focusing device
JPS6449228A (en) Blanking circuit for electron beam aligner
JPS5516791A (en) Electron beam welding method