GB1211227A - Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target - Google Patents

Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target

Info

Publication number
GB1211227A
GB1211227A GB2296067A GB2296067A GB1211227A GB 1211227 A GB1211227 A GB 1211227A GB 2296067 A GB2296067 A GB 2296067A GB 2296067 A GB2296067 A GB 2296067A GB 1211227 A GB1211227 A GB 1211227A
Authority
GB
United Kingdom
Prior art keywords
target
gates
arrangement
mark
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2296067A
Inventor
Michael James Underhill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Priority to GB2296067A priority Critical patent/GB1211227A/en
Publication of GB1211227A publication Critical patent/GB1211227A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/54Arrangements for centring ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

1,211,227. Template followers; programme control. MULLARD Ltd. Jan.26, 1968 [May 17, 1967], No.22960/67. Heading G3N. An apparatus for positioning the area of incidence of a beam of radiation on a target provided with a reference mark or marks having a different response to the radiation than the surrounding portion of the target and being at an angle to the beam axis and each mark having a first and second boundary edge portions at an angle to each other, has means scanning the beam over the edge portions and means for deriving an output signal in response to radiation incidence on the said target which is fed to first and second synchronous gates both coupled with the scanning means and means for feeding the outputs of the synchronous gates to deflection means to deflect the scanning beam in directions parallel to the edge portions so as to make the intersection between the beam and the edge portions coincide with a pair of unique points. The beam from an electron gun 2 is required to be located upon a point on a target 3 an area adjacent to the point having a different resistivity to the remainder of the target. The beam is positioned by a programme arrangement approxiamately on the point which is defined by the intersection of two lines so that when the beam is scanned preferably in a circular orbit by means of an oscillator 16 connected to X and Y deflection coils 4, 5 the beam will cut both lines. The electrons are collected on a lead 8 passed through an amplifier 9 and a reference level device 21 to synchronous gates 10, 11 which also have an input from the oscillator 16. If the centre of the beam scan lies other than in the position shown synchronous gates will have outputs other than zero which through deflection means 12, 13 move the beam into its correct position the gate outputs being stored at 14, 15 and added to that of the programme arrangement 17 so that the trace of the beam derived therefrom will start from its correct position relative to the remainder of the target 3. The synchronous gates may comprise phase detectors and if D.C. coupling is present between the lead 8 and the inputs of the gates, a component may be arranged to supply a D.C. bias so that peak level in its output are symmetrical about zero. In a preferred arrangement the coupling is A.C. The store outputs may apply a D.C. shift to the beam position via the deflection means 12, 13 or it may be arranged to alter the gain of the deflection means or it may be used as a control voltage for a correction term generator coupled with a deflection means. The beam may be used to cut out selected portions of the target or the target may be covered with photo-resist and the beam used to expose selected portions thereof, or the beam may be caused to deposit the chemical on the target surface by decomposing a chemical compound present in envolope 1 in the form of a vapour or gas. If the reference mark has different secondary emission characteristics to that of the surrounding target surface, a collector anode 21 may be provided inside the envelope to collect secondary electrons emitted from the target. The inputs to coils 4,and 5 may be alternatively applied to common coils 6 and 7. More than one mark may be employed on any one target the scanning being switched at appropriate points in the programme by the arrangement 17. The beam need not scan in a circular arc of closed loop form and the mark 18 may be replaced by a pair of marks divided by a blank strip along a diagonal, in which case the gates must be muted when the scan passes over the strip. The scan should be switched off, when not required, by the arrangement 17.
GB2296067A 1967-05-17 1967-05-17 Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target Expired GB1211227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2296067A GB1211227A (en) 1967-05-17 1967-05-17 Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2296067A GB1211227A (en) 1967-05-17 1967-05-17 Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target

Publications (1)

Publication Number Publication Date
GB1211227A true GB1211227A (en) 1970-11-04

Family

ID=10187844

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2296067A Expired GB1211227A (en) 1967-05-17 1967-05-17 Improvements in or relating to apparatus for positioning the area of incidence of a beam of radiation on a target

Country Status (1)

Country Link
GB (1) GB1211227A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9380690B2 (en) 2010-12-22 2016-06-28 Excillum Ab Aligning and focusing an electron beam in an X-ray source

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9380690B2 (en) 2010-12-22 2016-06-28 Excillum Ab Aligning and focusing an electron beam in an X-ray source
US9947502B2 (en) 2010-12-22 2018-04-17 Excillum Ab Aligning and focusing an electron beam in an X-ray source

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees