JPS64736A - Ion beam device - Google Patents

Ion beam device

Info

Publication number
JPS64736A
JPS64736A JP62066882A JP6688287A JPS64736A JP S64736 A JPS64736 A JP S64736A JP 62066882 A JP62066882 A JP 62066882A JP 6688287 A JP6688287 A JP 6688287A JP S64736 A JPS64736 A JP S64736A
Authority
JP
Japan
Prior art keywords
beams
irradiation
signal
electron beams
ion beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62066882A
Other languages
Japanese (ja)
Other versions
JPH01736A (en
Inventor
Toshio Yokoura
Kaoru Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62-66882A priority Critical patent/JPH01736A/en
Priority claimed from JP62-66882A external-priority patent/JPH01736A/en
Publication of JPS64736A publication Critical patent/JPS64736A/en
Publication of JPH01736A publication Critical patent/JPH01736A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To enable superposition exposure, etc., by ion beams with high accuracy by detecting an information signal generated with the irradiation of electron beams to a material, sensing the position of a mark formed to the material and compensating the position of the irradiation of ion beams.
CONSTITUTION: Electron beams are not bent by a deflecting plate 2 and rectilinearly propagate, and are converged thinly onto a material 12. A signal is transmitted over a deflection circuit 18 from a control means 17, and a mark section on the material is scanned with electron beams. Reflecting electrons generated with the irradiation of electron beams to the mark section are detected by a detector 13, and a detecting signal is transmitted over the control means 17 through a detector 16. The control means 17 sends a signal to a blanking deflection circuit 20 and a Wien filter power supply 19, and controls electrons beams and ion beams so that electron beams are bent by the deflecting plate 2 and projected to a trap 3 and ion beams are bent by a Wien filter 7 and applied onto the material 12. The position of irradiation onto the material of ion beams is changed in response to a signal transmitted over a deflecting plate 10 through the deflection circuit 18.
COPYRIGHT: (C)1989,JPO&Japio
JP62-66882A 1987-03-20 Ion beam device Pending JPH01736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62-66882A JPH01736A (en) 1987-03-20 Ion beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62-66882A JPH01736A (en) 1987-03-20 Ion beam device

Publications (2)

Publication Number Publication Date
JPS64736A true JPS64736A (en) 1989-01-05
JPH01736A JPH01736A (en) 1989-01-05

Family

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