JPS5645025A - Electron beam lithography apparatus - Google Patents

Electron beam lithography apparatus

Info

Publication number
JPS5645025A
JPS5645025A JP12068179A JP12068179A JPS5645025A JP S5645025 A JPS5645025 A JP S5645025A JP 12068179 A JP12068179 A JP 12068179A JP 12068179 A JP12068179 A JP 12068179A JP S5645025 A JPS5645025 A JP S5645025A
Authority
JP
Japan
Prior art keywords
rotation
sample
correction
rotation error
deflecting coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12068179A
Other languages
Japanese (ja)
Inventor
Kenichi Asanami
Sumio Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12068179A priority Critical patent/JPS5645025A/en
Publication of JPS5645025A publication Critical patent/JPS5645025A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To permit the correction of all the rotation error angles of an electron beam lithography apparatus without prealignment outside the apparatus by rotating a deflecting coil to correct the rotation error and feedbacking the correcting angle to the moving table. CONSTITUTION:A mark detection functioning unit 18 detects the mark end of a sample having reference marks, and a signal processing unit 17 obtains the barycentric coordinates of the two reference marks and calculates a rotation correcting angle theta. The signal corresponding to the angle causes a deflecting coil rotating source 11 to actuate a deflecting coil 16 to rotate by the rotation correcting angle. Thus, the rotation error angle theta made by the sample and a moving table 8 is corrected. This permits the rotation correction of the lithography field of even a sample which has a rotation error too large for an electrical correction.
JP12068179A 1979-09-21 1979-09-21 Electron beam lithography apparatus Pending JPS5645025A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12068179A JPS5645025A (en) 1979-09-21 1979-09-21 Electron beam lithography apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12068179A JPS5645025A (en) 1979-09-21 1979-09-21 Electron beam lithography apparatus

Publications (1)

Publication Number Publication Date
JPS5645025A true JPS5645025A (en) 1981-04-24

Family

ID=14792306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12068179A Pending JPS5645025A (en) 1979-09-21 1979-09-21 Electron beam lithography apparatus

Country Status (1)

Country Link
JP (1) JPS5645025A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS59181019A (en) * 1983-03-30 1984-10-15 Fujitsu Ltd Electron beam exposure device
US5663568A (en) * 1995-10-20 1997-09-02 Lucent Technologies Inc. Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494983A (en) * 1972-04-26 1974-01-17
JPS53145475A (en) * 1977-05-24 1978-12-18 Toshiba Corp Position detector

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494983A (en) * 1972-04-26 1974-01-17
JPS53145475A (en) * 1977-05-24 1978-12-18 Toshiba Corp Position detector

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135727A (en) * 1983-01-24 1984-08-04 Jeol Ltd Exposure by charged particle beam
JPS59181019A (en) * 1983-03-30 1984-10-15 Fujitsu Ltd Electron beam exposure device
JPH0574216B2 (en) * 1983-03-30 1993-10-18 Fujitsu Ltd
US5663568A (en) * 1995-10-20 1997-09-02 Lucent Technologies Inc. Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used

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