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Application filed by Предприятие П/Я Р-6476filedCriticalПредприятие П/Я Р-6476
Priority to SU752170819ApriorityCriticalpatent/SU620942A1/en
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Publication of SU620942A1publicationCriticalpatent/SU620942A1/en
Analysing Materials By The Use Of Radiation
(AREA)
Preparing Plates And Mask In Photomechanical Process
(AREA)
Description
при их одинаковой установке корректирующий сигнал полностью компенсирует систематические ошибки. Это обеспечивает повышение точности устройства.when installed in the same way, the correction signal fully compensates for systematic errors. This provides increased device accuracy.
Claims (1)
1. Авторское свидетельство СССР № 360644, М., КЛ.2 G 05 D 3/04, 1970.1. USSR author's certificate No. 360644, M., CL.2 G 05 D 3/04, 1970.
SU752170819A1975-09-111975-09-11Apparatus for focusing beam at electron reamwelding
SU620942A1
(en)