JPS6413726A - Rotation correct device of beam exposure apparatus - Google Patents

Abstract

PURPOSE:To accurately correct the position of a wafer placed on a stage in directly exposing the wafer to a beam while moving the stage in a filled unit by providing double-stage construction first and second correcting circuits, the first circuit including means for material rotation correction and the second one including means for rotation correction. CONSTITUTION:A stage is moved in X and Y directions upon calibration and angular differences thetaxs and thetays between a direction of deflection in a deflector 12 (i.e., scanning direction of an exposure beam) and said X and Y directions are estimated. The angular differences thetaxs, thetays are applied, in position correction amounts DELTAx, DELTAy being fed back by the deflector 12, to a second rotation correcting circuit 22 as a signal to rotation-correct the position correction amounts DELTAx, DELTAy. Then, the position of a globar mark on a wafer is measured, and angular differences thetax, thetay between the movement direction of the stage and the rotation amounts of the wafer are estimated. With the angular differences thetax, thetay estimated as such, they are set to the first rotation correcting circuit 21. Hereby pattern drawing coordinates (x, y) within a field are made to coincide with the direction of rotation of the wafer.