JPS55125651A - Production of semiconductor integrated circuit - Google Patents

Production of semiconductor integrated circuit

Info

Publication number
JPS55125651A
JPS55125651A JP3373479A JP3373479A JPS55125651A JP S55125651 A JPS55125651 A JP S55125651A JP 3373479 A JP3373479 A JP 3373479A JP 3373479 A JP3373479 A JP 3373479A JP S55125651 A JPS55125651 A JP S55125651A
Authority
JP
Japan
Prior art keywords
layer
poly
layers
resistance
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3373479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6136705B2 (cg-RX-API-DMAC10.html
Inventor
Mitsutaka Morimoto
Hiroki Muta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3373479A priority Critical patent/JPS55125651A/ja
Publication of JPS55125651A publication Critical patent/JPS55125651A/ja
Publication of JPS6136705B2 publication Critical patent/JPS6136705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W20/01—

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP3373479A 1979-03-22 1979-03-22 Production of semiconductor integrated circuit Granted JPS55125651A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3373479A JPS55125651A (en) 1979-03-22 1979-03-22 Production of semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3373479A JPS55125651A (en) 1979-03-22 1979-03-22 Production of semiconductor integrated circuit

Publications (2)

Publication Number Publication Date
JPS55125651A true JPS55125651A (en) 1980-09-27
JPS6136705B2 JPS6136705B2 (cg-RX-API-DMAC10.html) 1986-08-20

Family

ID=12394627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3373479A Granted JPS55125651A (en) 1979-03-22 1979-03-22 Production of semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS55125651A (cg-RX-API-DMAC10.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5941870A (ja) * 1982-08-25 1984-03-08 Toshiba Corp 半導体装置の製造方法
JPS5978560A (ja) * 1982-10-26 1984-05-07 Mitsubishi Electric Corp 半導体集積回路装置の製造方法
JPS59149045A (ja) * 1983-02-16 1984-08-25 Nec Corp 半導体装置の製造方法
US4935376A (en) * 1989-10-12 1990-06-19 At&T Bell Laboratories Making silicide gate level runners
JPH0594963A (ja) * 1990-08-16 1993-04-16 Internatl Business Mach Corp <Ibm> 集積回路の種々の厚さの耐火性金属シリサイド層を形成する方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5941870A (ja) * 1982-08-25 1984-03-08 Toshiba Corp 半導体装置の製造方法
JPS5978560A (ja) * 1982-10-26 1984-05-07 Mitsubishi Electric Corp 半導体集積回路装置の製造方法
JPS59149045A (ja) * 1983-02-16 1984-08-25 Nec Corp 半導体装置の製造方法
US4935376A (en) * 1989-10-12 1990-06-19 At&T Bell Laboratories Making silicide gate level runners
JPH0594963A (ja) * 1990-08-16 1993-04-16 Internatl Business Mach Corp <Ibm> 集積回路の種々の厚さの耐火性金属シリサイド層を形成する方法

Also Published As

Publication number Publication date
JPS6136705B2 (cg-RX-API-DMAC10.html) 1986-08-20

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