JPS55121675A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS55121675A JPS55121675A JP2855979A JP2855979A JPS55121675A JP S55121675 A JPS55121675 A JP S55121675A JP 2855979 A JP2855979 A JP 2855979A JP 2855979 A JP2855979 A JP 2855979A JP S55121675 A JPS55121675 A JP S55121675A
- Authority
- JP
- Japan
- Prior art keywords
- region
- emitter
- base
- substrate
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 4
- 238000005468 ion implantation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To enhance the reliability of a bipolar transistor by eliminating the projection of an emitter region through a base region at the peripheral edges of the base and emitter regions. CONSTITUTION:A thick oxide film 11 is formed at the field portion of an n-type semiconductor substrate 10, and a thin oxide film 11' is formed at the other portion of the substrate 10. Then, a p-type base region 12 is formed on the substrate, and a negative resist pattern 16 is formed in an emitter contact opening. Thereafter, the film 11' is etched, and an n-type emitter region 17 is formed by an ion implantation process. When the emitter region 17 is thus formed, it can eliminate the projection of the emitter region 17 through the base region 12 to short with the collector region (semiconductor substrate).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2855979A JPS55121675A (en) | 1979-03-12 | 1979-03-12 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2855979A JPS55121675A (en) | 1979-03-12 | 1979-03-12 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55121675A true JPS55121675A (en) | 1980-09-18 |
Family
ID=12251994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2855979A Pending JPS55121675A (en) | 1979-03-12 | 1979-03-12 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55121675A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59191372A (en) * | 1983-04-14 | 1984-10-30 | Nec Corp | Semiconductor device |
-
1979
- 1979-03-12 JP JP2855979A patent/JPS55121675A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59191372A (en) * | 1983-04-14 | 1984-10-30 | Nec Corp | Semiconductor device |
JPH0425705B2 (en) * | 1983-04-14 | 1992-05-01 | Nippon Electric Co |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57139965A (en) | Manufacture of semiconductor device | |
EP0768709A3 (en) | A BiCMOS process with low base recombination current bipolar transistor | |
JPS5591877A (en) | Manufacture of semiconductor device | |
JPS55121675A (en) | Manufacture of semiconductor device | |
JPS5710969A (en) | Semiconductor device and manufacture thereof | |
JPS561567A (en) | Manufacture of semiconductor device | |
JPS575358A (en) | Semiconductor device and manufacture thereof | |
JPS55163871A (en) | Semiconductor integrated circuit device | |
JPS57112063A (en) | Manufacture of semiconductor device | |
JPS5617067A (en) | Semiconductor switch | |
JPS5632763A (en) | Semiconductor device | |
JPS6455863A (en) | Manufacture of semiconductor device | |
JPS5297683A (en) | Semiconductor circuit device | |
JPS57120368A (en) | Manufacture of semiconductor device | |
JPS5721861A (en) | Manufacture of semiconductor device | |
JPS577943A (en) | Manufacture of semiconductor integrated circuit device | |
JPS5654062A (en) | Production of semiconductor device | |
JPS6425470A (en) | Manufacture of semiconductor device | |
JPS6482560A (en) | Lateral bipolar transistor | |
JPS5728356A (en) | Semiconductor device and manufacture thereof | |
JPS54153581A (en) | Manufacture for thyristor | |
JPS5496979A (en) | Manufacture of semiconductor integrated circuit device | |
JPS56115565A (en) | Semiconductor device | |
JPS57112072A (en) | Manufacture of semiconductor device | |
JPS57115865A (en) | Semiconductor integrated circuit |