JPS55121640A - Mask alignment method - Google Patents

Mask alignment method

Info

Publication number
JPS55121640A
JPS55121640A JP2965779A JP2965779A JPS55121640A JP S55121640 A JPS55121640 A JP S55121640A JP 2965779 A JP2965779 A JP 2965779A JP 2965779 A JP2965779 A JP 2965779A JP S55121640 A JPS55121640 A JP S55121640A
Authority
JP
Japan
Prior art keywords
wafer
mask
pressure
planes
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2965779A
Other languages
Japanese (ja)
Inventor
Takuma Nakamura
Kazumi Sugizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP2965779A priority Critical patent/JPS55121640A/en
Publication of JPS55121640A publication Critical patent/JPS55121640A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Abstract

PURPOSE:To obtain alignment with high precision on X, Y planes even when a wafer is moved in the Z direction by Controlling a mask to ensure that alignment operation or the X, Y planes and movement in the Z direction are related. CONSTITUTION:Pressure in a piston ring of a mask aligner 1 is increased to move a wafer in the Z direction. Pressure in the case when a mask and the wafer fast stick is detected by a pressure detecting portion 3 and memorized to a computer 5. Pressure is lowered, the wafer and the mask are separated only by a fixed space, a wafer XYtheta-movement control portion 7 is driven by the measurement of wafer position detection 2, and the wafer and the mask are aligned in coarse adjustment shapes. The wafer is upward moved only by a fixed distance in the Z direction by driving a pressure control portion 8, and the wafer and the mask are aligned on X, Y planes. The upward movement in the fixed distance in the Z direction and the alignment on the XY planes are repeated until the wafer and the mask fast stick, the Z direction and the XY directions are related, and the wafer and the mask are positioned.
JP2965779A 1979-03-13 1979-03-13 Mask alignment method Pending JPS55121640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2965779A JPS55121640A (en) 1979-03-13 1979-03-13 Mask alignment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2965779A JPS55121640A (en) 1979-03-13 1979-03-13 Mask alignment method

Publications (1)

Publication Number Publication Date
JPS55121640A true JPS55121640A (en) 1980-09-18

Family

ID=12282177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2965779A Pending JPS55121640A (en) 1979-03-13 1979-03-13 Mask alignment method

Country Status (1)

Country Link
JP (1) JPS55121640A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4563820A (en) * 1982-10-27 1986-01-14 Canon Kabushiki Kaisha Aligning system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS5364478A (en) * 1976-11-20 1978-06-08 Nippon Telegr & Teleph Corp <Ntt> Position aligning device
JPS5429978A (en) * 1977-08-10 1979-03-06 Hitachi Ltd Carrier device for semiconductor wafer and mask

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS5364478A (en) * 1976-11-20 1978-06-08 Nippon Telegr & Teleph Corp <Ntt> Position aligning device
JPS5429978A (en) * 1977-08-10 1979-03-06 Hitachi Ltd Carrier device for semiconductor wafer and mask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4563820A (en) * 1982-10-27 1986-01-14 Canon Kabushiki Kaisha Aligning system

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