JPS5492050A - Method and apparatus for astigmatic correction of scanning electronic microscope and others - Google Patents
Method and apparatus for astigmatic correction of scanning electronic microscope and othersInfo
- Publication number
- JPS5492050A JPS5492050A JP15779077A JP15779077A JPS5492050A JP S5492050 A JPS5492050 A JP S5492050A JP 15779077 A JP15779077 A JP 15779077A JP 15779077 A JP15779077 A JP 15779077A JP S5492050 A JPS5492050 A JP S5492050A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- minimum
- coil
- astigmatic correction
- astigmatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15779077A JPS5492050A (en) | 1977-12-29 | 1977-12-29 | Method and apparatus for astigmatic correction of scanning electronic microscope and others |
US05/970,860 US4214163A (en) | 1977-12-29 | 1978-12-18 | Method and apparatus for correcting astigmatism in a scanning electron microscope or the like |
FR7836738A FR2413779A1 (fr) | 1977-12-29 | 1978-12-28 | Methode et moyen pour corriger l'astigmatisme d'un microscope de balayage a faisceau electronique |
DE19782856688 DE2856688A1 (de) | 1977-12-29 | 1978-12-29 | Verfahren und vorrichtung zur korrektur von astigmatismus in einem rasterelektonenmikroskop |
GB7850335A GB2011656B (en) | 1977-12-29 | 1978-12-29 | Method and means for correcting astigmatism in a scanning electron microscope or the like |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15779077A JPS5492050A (en) | 1977-12-29 | 1977-12-29 | Method and apparatus for astigmatic correction of scanning electronic microscope and others |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3644579A Division JPS556784A (en) | 1979-03-28 | 1979-03-28 | Method and device for astrigmatism correction in scanning electron microscope |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5492050A true JPS5492050A (en) | 1979-07-20 |
JPS6134221B2 JPS6134221B2 (ja) | 1986-08-06 |
Family
ID=15657340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15779077A Granted JPS5492050A (en) | 1977-12-29 | 1977-12-29 | Method and apparatus for astigmatic correction of scanning electronic microscope and others |
Country Status (5)
Country | Link |
---|---|
US (1) | US4214163A (ja) |
JP (1) | JPS5492050A (ja) |
DE (1) | DE2856688A1 (ja) |
FR (1) | FR2413779A1 (ja) |
GB (1) | GB2011656B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918555A (ja) * | 1982-07-22 | 1984-01-30 | Erionikusu:Kk | 荷電粒子線取扱方法および装置 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5613649A (en) * | 1979-07-12 | 1981-02-10 | Akashi Seisakusho Co Ltd | Correcting method and device for astigmatism in scanning type electron microscope and the like |
NL7906632A (nl) * | 1979-09-05 | 1981-03-09 | Philips Nv | Automatische bundelcorrektie in stem. |
JPS56147350A (en) * | 1980-04-16 | 1981-11-16 | Nichidenshi Tekunikusu:Kk | Correction method and performing device of astigmatism |
JPS60147117A (ja) * | 1984-01-10 | 1985-08-03 | Fujitsu Ltd | 電子ビ−ム装置の調整方法 |
JPS63119147A (ja) * | 1986-11-07 | 1988-05-23 | Jeol Ltd | 荷電粒子線の集束状態を検出する装置 |
JPS63200444A (ja) * | 1987-02-16 | 1988-08-18 | Jeol Ltd | 走査型電子顕微鏡等の自動非点収差補正方法 |
JPH0756786B2 (ja) * | 1988-03-09 | 1995-06-14 | 株式会社日立製作所 | 電子顕微鏡の焦点合わせ装置 |
US5389858A (en) * | 1992-07-16 | 1995-02-14 | International Business Machines Corporation | Variable axis stigmator |
US6180947B1 (en) * | 1998-08-07 | 2001-01-30 | Nikon Corporation | Multi-element deflection aberration correction for electron beam lithography |
WO2005074002A2 (en) * | 2004-01-29 | 2005-08-11 | Applied Materials Israel, Ltd. | Focusing system and method for a charged particle imaging system |
US8609979B2 (en) | 2011-02-22 | 2013-12-17 | Skysun, LLC | Electromagnetic radiation concentrating system |
US9455115B2 (en) * | 2014-12-17 | 2016-09-27 | Carl Zeiss Microscopy Gmbh | Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834477A (ja) * | 1971-09-06 | 1973-05-18 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3409799A (en) * | 1966-08-29 | 1968-11-05 | Ibm | Automatic focusing system for beam devices |
DE1802450B1 (de) * | 1968-09-02 | 1970-07-02 | Siemens Ag | Verfahren zur Scharfstellung eines korpuskularstrahloptischen Bildes |
GB1325540A (en) * | 1969-10-10 | 1973-08-01 | Texas Instruments Ltd | Electron beam apparatus |
US3748467A (en) * | 1971-09-07 | 1973-07-24 | Nibon Denshi K K | Scanning electron microscope |
GB1463748A (en) * | 1973-09-03 | 1977-02-09 | Jeol Ltd | Electron beam apparatus |
GB1477030A (en) * | 1973-12-24 | 1977-06-22 | Jeol Ltd | Method and apparatus for the automatic focussing of electron beams in electron optical apparatus |
DE2542356C2 (de) * | 1975-09-19 | 1977-10-20 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung |
-
1977
- 1977-12-29 JP JP15779077A patent/JPS5492050A/ja active Granted
-
1978
- 1978-12-18 US US05/970,860 patent/US4214163A/en not_active Expired - Lifetime
- 1978-12-28 FR FR7836738A patent/FR2413779A1/fr active Granted
- 1978-12-29 DE DE19782856688 patent/DE2856688A1/de active Granted
- 1978-12-29 GB GB7850335A patent/GB2011656B/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834477A (ja) * | 1971-09-06 | 1973-05-18 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5918555A (ja) * | 1982-07-22 | 1984-01-30 | Erionikusu:Kk | 荷電粒子線取扱方法および装置 |
Also Published As
Publication number | Publication date |
---|---|
FR2413779B1 (ja) | 1984-10-26 |
FR2413779A1 (fr) | 1979-07-27 |
US4214163A (en) | 1980-07-22 |
GB2011656B (en) | 1982-06-30 |
GB2011656A (en) | 1979-07-11 |
DE2856688C2 (ja) | 1987-06-19 |
DE2856688A1 (de) | 1979-07-05 |
JPS6134221B2 (ja) | 1986-08-06 |
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