JPS5492051A - Focusing method and its apparatus for electron beam device - Google Patents
Focusing method and its apparatus for electron beam deviceInfo
- Publication number
- JPS5492051A JPS5492051A JP15779277A JP15779277A JPS5492051A JP S5492051 A JPS5492051 A JP S5492051A JP 15779277 A JP15779277 A JP 15779277A JP 15779277 A JP15779277 A JP 15779277A JP S5492051 A JPS5492051 A JP S5492051A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- circuit
- sample
- scanning
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To secure the irradiation of the electron beam flux to the test sample in the state of the minimum aberrated circle by scanning the sample in two different ways by means of the electron beam and then obtaining the condenser lens current value with which the electron beam diameter becomes minimum.
CONSTITUTION: The electron beam condensed through objective lens 12 is deflected by deflecting coil 13X and 13Y to scan on sample 11 to be observed. In this case, switch circuit 18 provided at the circuit is turned toward focusing device 16, swtich circuit 26X and 26Y and turned toward terminals 2 of scanning signal generator 25X and 25Y each, and other switches 22 and 23 are opened. After this, the focusing action is started to vary the object lens current gradually and in steps with every scanning via the electron beam, and the secondary electron given from sample 11 is detected through detector 14. Then the secondary scanning is integrated to generate the stop signal at timing circuit 17 when the integrating value becomes maximum. And the current of lens 12 is fixed then to be memorized in memory circuit 20. This method is applied also in other directions.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52157792A JPS5816746B2 (en) | 1977-12-29 | 1977-12-29 | Focusing method and device in electron beam equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52157792A JPS5816746B2 (en) | 1977-12-29 | 1977-12-29 | Focusing method and device in electron beam equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5492051A true JPS5492051A (en) | 1979-07-20 |
JPS5816746B2 JPS5816746B2 (en) | 1983-04-01 |
Family
ID=15657380
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52157792A Expired JPS5816746B2 (en) | 1977-12-29 | 1977-12-29 | Focusing method and device in electron beam equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5816746B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5766637A (en) * | 1980-10-14 | 1982-04-22 | Toshiba Corp | Exposure device for electron beam |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834477A (en) * | 1971-09-06 | 1973-05-18 | ||
JPS5049442A (en) * | 1973-09-06 | 1975-05-02 | ||
JPS5212560A (en) * | 1975-07-21 | 1977-01-31 | Hitachi Ltd | Electronic beam probe control device |
-
1977
- 1977-12-29 JP JP52157792A patent/JPS5816746B2/en not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834477A (en) * | 1971-09-06 | 1973-05-18 | ||
JPS5049442A (en) * | 1973-09-06 | 1975-05-02 | ||
JPS5212560A (en) * | 1975-07-21 | 1977-01-31 | Hitachi Ltd | Electronic beam probe control device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5766637A (en) * | 1980-10-14 | 1982-04-22 | Toshiba Corp | Exposure device for electron beam |
Also Published As
Publication number | Publication date |
---|---|
JPS5816746B2 (en) | 1983-04-01 |
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