JPS4834477A - - Google Patents

Info

Publication number
JPS4834477A
JPS4834477A JP6866171A JP6866171A JPS4834477A JP S4834477 A JPS4834477 A JP S4834477A JP 6866171 A JP6866171 A JP 6866171A JP 6866171 A JP6866171 A JP 6866171A JP S4834477 A JPS4834477 A JP S4834477A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6866171A
Other languages
Japanese (ja)
Other versions
JPS5427703B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6866171A priority Critical patent/JPS5427703B2/ja
Publication of JPS4834477A publication Critical patent/JPS4834477A/ja
Publication of JPS5427703B2 publication Critical patent/JPS5427703B2/ja
Expired legal-status Critical Current

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  • Electron Beam Exposure (AREA)
JP6866171A 1971-09-06 1971-09-06 Expired JPS5427703B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6866171A JPS5427703B2 (en) 1971-09-06 1971-09-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6866171A JPS5427703B2 (en) 1971-09-06 1971-09-06

Publications (2)

Publication Number Publication Date
JPS4834477A true JPS4834477A (en) 1973-05-18
JPS5427703B2 JPS5427703B2 (en) 1979-09-11

Family

ID=13380099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6866171A Expired JPS5427703B2 (en) 1971-09-06 1971-09-06

Country Status (1)

Country Link
JP (1) JPS5427703B2 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5096174A (en) * 1973-12-24 1975-07-31
JPS51134556A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Sample picture indication unit
JPS51136278A (en) * 1975-05-21 1976-11-25 Hitachi Ltd Non-spot aberration compensator for electron microscope having electri c field radiation gun
JPS53966A (en) * 1977-05-12 1978-01-07 Akashi Seisakusho Kk Electron illuminator
JPS5462768A (en) * 1977-10-28 1979-05-21 Erionikusu Kk Method of correcting astigmatism for electron beam application device
JPS5469374A (en) * 1977-11-15 1979-06-04 Nippon Steel Corp Automatic focusing method of electron microscope
JPS5492051A (en) * 1977-12-29 1979-07-20 Jeol Ltd Focusing method and its apparatus for electron beam device
JPS5492050A (en) * 1977-12-29 1979-07-20 Jeol Ltd Method and apparatus for astigmatic correction of scanning electronic microscope and others
JPS54100661A (en) * 1978-01-25 1979-08-08 Jeol Ltd Focusing unit of electron-beam device
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS556784A (en) * 1979-03-28 1980-01-18 Jeol Ltd Method and device for astrigmatism correction in scanning electron microscope
JPS5918555A (en) * 1982-07-22 1984-01-30 Erionikusu:Kk Method for handling charged particle ray and its device
JPS61210868A (en) * 1985-03-13 1986-09-19 Agency Of Ind Science & Technol Coal mhd generator
JPH0210823A (en) * 1988-06-29 1990-01-16 Toshiba Corp Manufacture of semiconductor device

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917496B2 (en) * 1973-12-24 1984-04-21 日本電子株式会社 Focusing method and device for scanning electron microscope, etc.
JPS5096174A (en) * 1973-12-24 1975-07-31
JPS51134556A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Sample picture indication unit
JPS51136278A (en) * 1975-05-21 1976-11-25 Hitachi Ltd Non-spot aberration compensator for electron microscope having electri c field radiation gun
JPS53966A (en) * 1977-05-12 1978-01-07 Akashi Seisakusho Kk Electron illuminator
JPS5542459B2 (en) * 1977-05-12 1980-10-30
JPS5462768A (en) * 1977-10-28 1979-05-21 Erionikusu Kk Method of correcting astigmatism for electron beam application device
JPS5469374A (en) * 1977-11-15 1979-06-04 Nippon Steel Corp Automatic focusing method of electron microscope
JPS5816746B2 (en) * 1977-12-29 1983-04-01 日本電子株式会社 Focusing method and device in electron beam equipment
JPS5492051A (en) * 1977-12-29 1979-07-20 Jeol Ltd Focusing method and its apparatus for electron beam device
JPS5492050A (en) * 1977-12-29 1979-07-20 Jeol Ltd Method and apparatus for astigmatic correction of scanning electronic microscope and others
JPS6134221B2 (en) * 1977-12-29 1986-08-06 Nippon Electron Optics Lab
JPS54100661A (en) * 1978-01-25 1979-08-08 Jeol Ltd Focusing unit of electron-beam device
JPS5848989B2 (en) * 1978-01-25 1983-11-01 日本電子株式会社 Focusing device in electron beam equipment
JPS5549768B2 (en) * 1978-02-10 1980-12-13
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS556784A (en) * 1979-03-28 1980-01-18 Jeol Ltd Method and device for astrigmatism correction in scanning electron microscope
JPS6151377B2 (en) * 1979-03-28 1986-11-08 Nippon Electron Optics Lab
JPS5918555A (en) * 1982-07-22 1984-01-30 Erionikusu:Kk Method for handling charged particle ray and its device
JPS61210868A (en) * 1985-03-13 1986-09-19 Agency Of Ind Science & Technol Coal mhd generator
JPH0210823A (en) * 1988-06-29 1990-01-16 Toshiba Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5427703B2 (en) 1979-09-11

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