JPS5483386A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5483386A JPS5483386A JP15126777A JP15126777A JPS5483386A JP S5483386 A JPS5483386 A JP S5483386A JP 15126777 A JP15126777 A JP 15126777A JP 15126777 A JP15126777 A JP 15126777A JP S5483386 A JPS5483386 A JP S5483386A
- Authority
- JP
- Japan
- Prior art keywords
- film
- solar battery
- type
- substrate
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE: To provide a solar battery on the semiconductor substrate, while separating the former from the latter with insulator film, for forming an integrated circuit and to use the energy from the solar battery obtained by light irradiation for the drive source of the integrated circuit, thereby obtaining a self-operating semiconductor device without increasing its chip area.
CONSTITUTION: The N+-type source region 32 and N+-type drain region 33 of the N-channel MOS transistor are formed by diffusion on the P-type Si substrate 31; and between these two regions, a gate electrode 34 is provided through insulator film. Next, region 32 is connected to the top surface of substrate 31 by means of external wiring, and then the entire portion is covered with insulator film 35. Later, N-type multiple crystal Si film 36 is made by gas phase growth on film 35, and P- type layer 37 is formed by diffusion on the top-surface layer of Si film 36 to cause a PN junction, thereby forming a solar battery. In this constitution, layer 37 is connected to drain region 33 of the transistor, and film 36 is connected to its source region 32. Further, if necessary, secondary battery 38 for charging and discharging the solar battery may be connected to both ends of the solar battery.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15126777A JPS5483386A (en) | 1977-12-15 | 1977-12-15 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15126777A JPS5483386A (en) | 1977-12-15 | 1977-12-15 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5483386A true JPS5483386A (en) | 1979-07-03 |
Family
ID=15514919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15126777A Pending JPS5483386A (en) | 1977-12-15 | 1977-12-15 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5483386A (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633874A (en) * | 1979-08-29 | 1981-04-04 | Hitachi Ltd | Semiconductor device builtin with photocell |
JPS5760231U (en) * | 1980-09-27 | 1982-04-09 | ||
JPS5772369A (en) * | 1980-10-24 | 1982-05-06 | Hitachi Ltd | Semiconductor device building in light receiving element |
JPS5790981A (en) * | 1980-11-27 | 1982-06-05 | Mitsubishi Electric Corp | Semiconductor device |
JPS5890786A (en) * | 1981-11-25 | 1983-05-30 | Mitsubishi Electric Corp | Semiconductor device |
JPS5895874A (en) * | 1981-11-30 | 1983-06-07 | Mitsubishi Electric Corp | Semiconductor device |
JPS58140154A (en) * | 1982-02-15 | 1983-08-19 | Seiko Epson Corp | Semiconductor integrated circuit device |
JPS5922360A (en) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Works Ltd | Optical input mos type transistor |
JPS5978569A (en) * | 1982-10-27 | 1984-05-07 | Seiko Epson Corp | Semiconductor device |
JPS59213161A (en) * | 1983-05-19 | 1984-12-03 | Matsushita Electric Ind Co Ltd | Semiconductor device |
JPH02194558A (en) * | 1989-01-21 | 1990-08-01 | Nippondenso Co Ltd | Semiconductor device and manufacture thereof |
CN103000739A (en) * | 2011-09-16 | 2013-03-27 | 深圳光启高等理工研究院 | Electronic device and circuit power unit therefor |
TWI476942B (en) * | 2011-05-31 | 2015-03-11 | Motech Suzhou Renewable Energy Co Ltd | Texturing method for mono-like silicon chip |
-
1977
- 1977-12-15 JP JP15126777A patent/JPS5483386A/en active Pending
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633874A (en) * | 1979-08-29 | 1981-04-04 | Hitachi Ltd | Semiconductor device builtin with photocell |
JPS5760231U (en) * | 1980-09-27 | 1982-04-09 | ||
JPS5772369A (en) * | 1980-10-24 | 1982-05-06 | Hitachi Ltd | Semiconductor device building in light receiving element |
JPS5790981A (en) * | 1980-11-27 | 1982-06-05 | Mitsubishi Electric Corp | Semiconductor device |
JPH0227825B2 (en) * | 1981-11-25 | 1990-06-20 | Mitsubishi Electric Corp | |
JPS5890786A (en) * | 1981-11-25 | 1983-05-30 | Mitsubishi Electric Corp | Semiconductor device |
JPS5895874A (en) * | 1981-11-30 | 1983-06-07 | Mitsubishi Electric Corp | Semiconductor device |
JPS58140154A (en) * | 1982-02-15 | 1983-08-19 | Seiko Epson Corp | Semiconductor integrated circuit device |
JPS5922360A (en) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Works Ltd | Optical input mos type transistor |
JPS5978569A (en) * | 1982-10-27 | 1984-05-07 | Seiko Epson Corp | Semiconductor device |
JPH0475666B2 (en) * | 1982-10-27 | 1992-12-01 | Seiko Epson Corp | |
JPS59213161A (en) * | 1983-05-19 | 1984-12-03 | Matsushita Electric Ind Co Ltd | Semiconductor device |
JPH02194558A (en) * | 1989-01-21 | 1990-08-01 | Nippondenso Co Ltd | Semiconductor device and manufacture thereof |
TWI476942B (en) * | 2011-05-31 | 2015-03-11 | Motech Suzhou Renewable Energy Co Ltd | Texturing method for mono-like silicon chip |
CN103000739A (en) * | 2011-09-16 | 2013-03-27 | 深圳光启高等理工研究院 | Electronic device and circuit power unit therefor |
CN103000739B (en) * | 2011-09-16 | 2016-01-06 | 深圳光启高等理工研究院 | The supply unit of a kind of electronic equipment and circuit thereof |
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