JPS5558561A - Semiconductor capacitance element - Google Patents

Semiconductor capacitance element

Info

Publication number
JPS5558561A
JPS5558561A JP13053678A JP13053678A JPS5558561A JP S5558561 A JPS5558561 A JP S5558561A JP 13053678 A JP13053678 A JP 13053678A JP 13053678 A JP13053678 A JP 13053678A JP S5558561 A JPS5558561 A JP S5558561A
Authority
JP
Japan
Prior art keywords
capacitance element
resistance
connecting unit
divide
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13053678A
Other languages
Japanese (ja)
Other versions
JPS6236395B2 (en
Inventor
Katsuhisa Tachikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13053678A priority Critical patent/JPS5558561A/en
Publication of JPS5558561A publication Critical patent/JPS5558561A/en
Publication of JPS6236395B2 publication Critical patent/JPS6236395B2/ja
Granted legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To eliminate the effect of parasitic resistance, by providing a connecting unit in a semiconductor well and in a polycrystalline semiconductor layer at positions where these are divided into resistance regions and connecting them electrically.
CONSTITUTION: Polycrystalline Si layer 6 is provided with connecting unit 8' by means of Al wiring so as to divide the sheet resistance by opening a window on the protective film. P+ well is provided with diffusion layer 4', and on top of this is provided connecting unit 9' by means of Al wiring so as to divide the diffusion resistance. By this structure, the effect of parasitic resistance on the capacitance element used for high-frequency oscillation can be eliminated. It is effective when the distances between MOS gate and source and drain, used as capacitance element, are made short as much as possible and equal.
COPYRIGHT: (C)1980,JPO&Japio
JP13053678A 1978-10-25 1978-10-25 Semiconductor capacitance element Granted JPS5558561A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13053678A JPS5558561A (en) 1978-10-25 1978-10-25 Semiconductor capacitance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13053678A JPS5558561A (en) 1978-10-25 1978-10-25 Semiconductor capacitance element

Publications (2)

Publication Number Publication Date
JPS5558561A true JPS5558561A (en) 1980-05-01
JPS6236395B2 JPS6236395B2 (en) 1987-08-06

Family

ID=15036630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13053678A Granted JPS5558561A (en) 1978-10-25 1978-10-25 Semiconductor capacitance element

Country Status (1)

Country Link
JP (1) JPS5558561A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850767A (en) * 1981-09-21 1983-03-25 Hitachi Ltd Semiconductor device
JPS58159367A (en) * 1982-03-17 1983-09-21 Matsushita Electronics Corp Mos capacitor device
JPS58210668A (en) * 1982-05-31 1983-12-07 Matsushita Electric Ind Co Ltd Semiconductor integrated circuit
JPS5931049A (en) * 1982-08-13 1984-02-18 Mitsubishi Electric Corp Semiconductor integrated circuit device
JPH01162381A (en) * 1987-11-27 1989-06-26 American Teleph & Telegr Co <Att> Voltage control variable capacitor and variable frequency oscillator
US6410954B1 (en) 2000-04-10 2002-06-25 Koninklijke Philips Electronics N.V. Multilayered capacitor structure with alternately connected concentric lines for deep sub-micron CMOS

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5850767A (en) * 1981-09-21 1983-03-25 Hitachi Ltd Semiconductor device
JPS58159367A (en) * 1982-03-17 1983-09-21 Matsushita Electronics Corp Mos capacitor device
JPS58210668A (en) * 1982-05-31 1983-12-07 Matsushita Electric Ind Co Ltd Semiconductor integrated circuit
JPS5931049A (en) * 1982-08-13 1984-02-18 Mitsubishi Electric Corp Semiconductor integrated circuit device
JPH01162381A (en) * 1987-11-27 1989-06-26 American Teleph & Telegr Co <Att> Voltage control variable capacitor and variable frequency oscillator
US6410954B1 (en) 2000-04-10 2002-06-25 Koninklijke Philips Electronics N.V. Multilayered capacitor structure with alternately connected concentric lines for deep sub-micron CMOS

Also Published As

Publication number Publication date
JPS6236395B2 (en) 1987-08-06

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