JPS5466776A - Fine pattern forming method - Google Patents

Fine pattern forming method

Info

Publication number
JPS5466776A
JPS5466776A JP13333877A JP13333877A JPS5466776A JP S5466776 A JPS5466776 A JP S5466776A JP 13333877 A JP13333877 A JP 13333877A JP 13333877 A JP13333877 A JP 13333877A JP S5466776 A JPS5466776 A JP S5466776A
Authority
JP
Japan
Prior art keywords
fine pattern
resist
minutes
form fine
dimensional mesh
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13333877A
Other languages
English (en)
Other versions
JPS5713864B2 (ja
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13333877A priority Critical patent/JPS5466776A/ja
Publication of JPS5466776A publication Critical patent/JPS5466776A/ja
Publication of JPS5713864B2 publication Critical patent/JPS5713864B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13333877A 1977-11-07 1977-11-07 Fine pattern forming method Granted JPS5466776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13333877A JPS5466776A (en) 1977-11-07 1977-11-07 Fine pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13333877A JPS5466776A (en) 1977-11-07 1977-11-07 Fine pattern forming method

Publications (2)

Publication Number Publication Date
JPS5466776A true JPS5466776A (en) 1979-05-29
JPS5713864B2 JPS5713864B2 (ja) 1982-03-19

Family

ID=15102372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13333877A Granted JPS5466776A (en) 1977-11-07 1977-11-07 Fine pattern forming method

Country Status (1)

Country Link
JP (1) JPS5466776A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5499621A (en) * 1977-12-24 1979-08-06 Licentia Gmbh Radiant ray sensitive material having positive operation
JPS54158173A (en) * 1978-06-05 1979-12-13 Fujitsu Ltd Micropattern forming method
JPS54161320A (en) * 1978-06-12 1979-12-20 Fujitsu Ltd Production of cross linking type resist
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
JPS6055630A (ja) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59168567U (ja) * 1983-04-28 1984-11-12 日産ディーゼル工業株式会社 内燃機関の複式エアヒ−タ装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5381116A (en) * 1976-12-25 1978-07-18 Agency Of Ind Science & Technol Radiation sensitive polymer and its working method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51105353A (ja) * 1975-03-07 1976-09-17 Hitachi Ltd Denshisenkannoseikobunshisoseibutsu
JPS5353314A (en) * 1976-10-26 1978-05-15 Agency Of Ind Science & Technol Sensitive high polymer composition and picture imae forming method usingsaid composition
JPS5381116A (en) * 1976-12-25 1978-07-18 Agency Of Ind Science & Technol Radiation sensitive polymer and its working method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5499621A (en) * 1977-12-24 1979-08-06 Licentia Gmbh Radiant ray sensitive material having positive operation
JPS54158173A (en) * 1978-06-05 1979-12-13 Fujitsu Ltd Micropattern forming method
JPS54161320A (en) * 1978-06-12 1979-12-20 Fujitsu Ltd Production of cross linking type resist
JPS5653733B2 (ja) * 1978-06-12 1981-12-21
JPS55117239A (en) * 1979-03-02 1980-09-09 Fujitsu Ltd Making method of microminiature pattern
JPS5720615B2 (ja) * 1979-03-02 1982-04-30
JPS55133042A (en) * 1979-04-04 1980-10-16 Fujitsu Ltd Pattern forming method
JPS574893B2 (ja) * 1979-04-04 1982-01-28
JPS6055630A (ja) * 1983-09-06 1985-03-30 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法
JPH0335654B2 (ja) * 1983-09-06 1991-05-29 Oki Electric Ind Co Ltd
JPS6236657A (ja) * 1985-08-10 1987-02-17 Japan Synthetic Rubber Co Ltd 半導体微細加工用レジスト組成物

Also Published As

Publication number Publication date
JPS5713864B2 (ja) 1982-03-19

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