JPS5466776A - Fine pattern forming method - Google Patents
Fine pattern forming methodInfo
- Publication number
- JPS5466776A JPS5466776A JP13333877A JP13333877A JPS5466776A JP S5466776 A JPS5466776 A JP S5466776A JP 13333877 A JP13333877 A JP 13333877A JP 13333877 A JP13333877 A JP 13333877A JP S5466776 A JPS5466776 A JP S5466776A
- Authority
- JP
- Japan
- Prior art keywords
- fine pattern
- resist
- minutes
- form fine
- dimensional mesh
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333877A JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13333877A JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5466776A true JPS5466776A (en) | 1979-05-29 |
JPS5713864B2 JPS5713864B2 (ja) | 1982-03-19 |
Family
ID=15102372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13333877A Granted JPS5466776A (en) | 1977-11-07 | 1977-11-07 | Fine pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5466776A (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5499621A (en) * | 1977-12-24 | 1979-08-06 | Licentia Gmbh | Radiant ray sensitive material having positive operation |
JPS54158173A (en) * | 1978-06-05 | 1979-12-13 | Fujitsu Ltd | Micropattern forming method |
JPS54161320A (en) * | 1978-06-12 | 1979-12-20 | Fujitsu Ltd | Production of cross linking type resist |
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
JPS6055630A (ja) * | 1983-09-06 | 1985-03-30 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
JPS6236657A (ja) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | 半導体微細加工用レジスト組成物 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59168567U (ja) * | 1983-04-28 | 1984-11-12 | 日産ディーゼル工業株式会社 | 内燃機関の複式エアヒ−タ装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51105353A (ja) * | 1975-03-07 | 1976-09-17 | Hitachi Ltd | Denshisenkannoseikobunshisoseibutsu |
JPS5353314A (en) * | 1976-10-26 | 1978-05-15 | Agency Of Ind Science & Technol | Sensitive high polymer composition and picture imae forming method usingsaid composition |
JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
-
1977
- 1977-11-07 JP JP13333877A patent/JPS5466776A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51105353A (ja) * | 1975-03-07 | 1976-09-17 | Hitachi Ltd | Denshisenkannoseikobunshisoseibutsu |
JPS5353314A (en) * | 1976-10-26 | 1978-05-15 | Agency Of Ind Science & Technol | Sensitive high polymer composition and picture imae forming method usingsaid composition |
JPS5381116A (en) * | 1976-12-25 | 1978-07-18 | Agency Of Ind Science & Technol | Radiation sensitive polymer and its working method |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5499621A (en) * | 1977-12-24 | 1979-08-06 | Licentia Gmbh | Radiant ray sensitive material having positive operation |
JPS54158173A (en) * | 1978-06-05 | 1979-12-13 | Fujitsu Ltd | Micropattern forming method |
JPS54161320A (en) * | 1978-06-12 | 1979-12-20 | Fujitsu Ltd | Production of cross linking type resist |
JPS5653733B2 (ja) * | 1978-06-12 | 1981-12-21 | ||
JPS55117239A (en) * | 1979-03-02 | 1980-09-09 | Fujitsu Ltd | Making method of microminiature pattern |
JPS5720615B2 (ja) * | 1979-03-02 | 1982-04-30 | ||
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
JPS574893B2 (ja) * | 1979-04-04 | 1982-01-28 | ||
JPS6055630A (ja) * | 1983-09-06 | 1985-03-30 | Oki Electric Ind Co Ltd | レジストパタ−ンの形成方法 |
JPH0335654B2 (ja) * | 1983-09-06 | 1991-05-29 | Oki Electric Ind Co Ltd | |
JPS6236657A (ja) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | 半導体微細加工用レジスト組成物 |
Also Published As
Publication number | Publication date |
---|---|
JPS5713864B2 (ja) | 1982-03-19 |
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