JPS54158173A - Micropattern forming method - Google Patents
Micropattern forming methodInfo
- Publication number
- JPS54158173A JPS54158173A JP6666678A JP6666678A JPS54158173A JP S54158173 A JPS54158173 A JP S54158173A JP 6666678 A JP6666678 A JP 6666678A JP 6666678 A JP6666678 A JP 6666678A JP S54158173 A JPS54158173 A JP S54158173A
- Authority
- JP
- Japan
- Prior art keywords
- component
- resist
- specified
- forming method
- micropattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE: To secure an easy formation of the micropattern for the micropattern forming method using the ionizing radiation by applying the resist to the substrate, which is obtained by dissolving the specified component and the copolymer containing the unit composed of the specified component into the specified solvent.
CONSTITUTION: The copolymer is formed containing the unit obtained from the following components: component A composed of the ester methacrylate containing the alkyl group, cycloalkyl group or alalkyl group; component B composed of the methacrylate chloride or other monoethylene unsaturated aliphatic carboxylic acid; and component C composed of the methacrylate chloride or other monoethylene unsaturated aliphatic carboxylic chloride respectively. The units led from component B and C are set to 1W20 mol% and 0.05W3 mol% each, and the resist obtained by dissolving the copolymer containing more component B than C into the solvent is applied to the substrate. This resist undergoes the prebaking to draw the pattern with irradiation of the ionizing radiation, and then the pattern is formed through development.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6666678A JPS54158173A (en) | 1978-06-05 | 1978-06-05 | Micropattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6666678A JPS54158173A (en) | 1978-06-05 | 1978-06-05 | Micropattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54158173A true JPS54158173A (en) | 1979-12-13 |
Family
ID=13322444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6666678A Pending JPS54158173A (en) | 1978-06-05 | 1978-06-05 | Micropattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54158173A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61201426A (en) * | 1985-03-04 | 1986-09-06 | Sony Corp | Baking of photoresist |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103632A (en) * | 1972-12-21 | 1974-10-01 | Philips Nv | |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
JPS5466829A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Pattern formation materil |
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
-
1978
- 1978-06-05 JP JP6666678A patent/JPS54158173A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103632A (en) * | 1972-12-21 | 1974-10-01 | Philips Nv | |
JPS51117577A (en) * | 1975-03-20 | 1976-10-15 | Philips Nv | Positive operation type electron resist |
JPS5466829A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Pattern formation materil |
JPS5466776A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Fine pattern forming method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61201426A (en) * | 1985-03-04 | 1986-09-06 | Sony Corp | Baking of photoresist |
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