JPS53100774A - Resist composition for short eavelength ultraviolet light - Google Patents
Resist composition for short eavelength ultraviolet lightInfo
- Publication number
- JPS53100774A JPS53100774A JP1460577A JP1460577A JPS53100774A JP S53100774 A JPS53100774 A JP S53100774A JP 1460577 A JP1460577 A JP 1460577A JP 1460577 A JP1460577 A JP 1460577A JP S53100774 A JPS53100774 A JP S53100774A
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- eavelength
- short
- ultraviolet light
- metharylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To obtain resist pattern of a shape ratio of high sensitivity and high resolution by dissolving alkyl halogenide metharylate polymer in a solvent thereby making resist composition.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1460577A JPS53100774A (en) | 1977-02-15 | 1977-02-15 | Resist composition for short eavelength ultraviolet light |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1460577A JPS53100774A (en) | 1977-02-15 | 1977-02-15 | Resist composition for short eavelength ultraviolet light |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53100774A true JPS53100774A (en) | 1978-09-02 |
Family
ID=11865823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1460577A Pending JPS53100774A (en) | 1977-02-15 | 1977-02-15 | Resist composition for short eavelength ultraviolet light |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53100774A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53135703A (en) * | 1977-04-26 | 1978-11-27 | Int Standard Electric Corp | Resist material for printing xxray lithographic plate |
JPS5488215A (en) * | 1977-12-20 | 1979-07-13 | Itoh Oil Mfg | Branched alcohol ester and cosmetics compounded therewith |
WO2017130873A1 (en) * | 2016-01-29 | 2017-08-03 | 日本ゼオン株式会社 | Resist pattern forming method |
WO2017130872A1 (en) * | 2016-01-29 | 2017-08-03 | 日本ゼオン株式会社 | Resist pattern forming method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
-
1977
- 1977-02-15 JP JP1460577A patent/JPS53100774A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53135703A (en) * | 1977-04-26 | 1978-11-27 | Int Standard Electric Corp | Resist material for printing xxray lithographic plate |
JPS5721698B2 (en) * | 1977-04-26 | 1982-05-08 | ||
JPS5488215A (en) * | 1977-12-20 | 1979-07-13 | Itoh Oil Mfg | Branched alcohol ester and cosmetics compounded therewith |
JPS6019736B2 (en) * | 1977-12-20 | 1985-05-17 | 伊藤製油株式会社 | Branched alcohol ester and cosmetics containing it |
WO2017130873A1 (en) * | 2016-01-29 | 2017-08-03 | 日本ゼオン株式会社 | Resist pattern forming method |
WO2017130872A1 (en) * | 2016-01-29 | 2017-08-03 | 日本ゼオン株式会社 | Resist pattern forming method |
JPWO2017130873A1 (en) * | 2016-01-29 | 2018-11-22 | 日本ゼオン株式会社 | Resist pattern forming method |
JPWO2017130872A1 (en) * | 2016-01-29 | 2018-11-22 | 日本ゼオン株式会社 | Resist pattern forming method |
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