JPS53100774A - Resist composition for short eavelength ultraviolet light - Google Patents

Resist composition for short eavelength ultraviolet light

Info

Publication number
JPS53100774A
JPS53100774A JP1460577A JP1460577A JPS53100774A JP S53100774 A JPS53100774 A JP S53100774A JP 1460577 A JP1460577 A JP 1460577A JP 1460577 A JP1460577 A JP 1460577A JP S53100774 A JPS53100774 A JP S53100774A
Authority
JP
Japan
Prior art keywords
resist composition
eavelength
short
ultraviolet light
metharylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1460577A
Other languages
Japanese (ja)
Inventor
Masami Kakuchi
Shungo Sugawara
Yoshiaki Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP1460577A priority Critical patent/JPS53100774A/en
Publication of JPS53100774A publication Critical patent/JPS53100774A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain resist pattern of a shape ratio of high sensitivity and high resolution by dissolving alkyl halogenide metharylate polymer in a solvent thereby making resist composition.
COPYRIGHT: (C)1978,JPO&Japio
JP1460577A 1977-02-15 1977-02-15 Resist composition for short eavelength ultraviolet light Pending JPS53100774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1460577A JPS53100774A (en) 1977-02-15 1977-02-15 Resist composition for short eavelength ultraviolet light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1460577A JPS53100774A (en) 1977-02-15 1977-02-15 Resist composition for short eavelength ultraviolet light

Publications (1)

Publication Number Publication Date
JPS53100774A true JPS53100774A (en) 1978-09-02

Family

ID=11865823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1460577A Pending JPS53100774A (en) 1977-02-15 1977-02-15 Resist composition for short eavelength ultraviolet light

Country Status (1)

Country Link
JP (1) JPS53100774A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135703A (en) * 1977-04-26 1978-11-27 Int Standard Electric Corp Resist material for printing xxray lithographic plate
JPS5488215A (en) * 1977-12-20 1979-07-13 Itoh Oil Mfg Branched alcohol ester and cosmetics compounded therewith
WO2017130873A1 (en) * 2016-01-29 2017-08-03 日本ゼオン株式会社 Resist pattern forming method
WO2017130872A1 (en) * 2016-01-29 2017-08-03 日本ゼオン株式会社 Resist pattern forming method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135703A (en) * 1977-04-26 1978-11-27 Int Standard Electric Corp Resist material for printing xxray lithographic plate
JPS5721698B2 (en) * 1977-04-26 1982-05-08
JPS5488215A (en) * 1977-12-20 1979-07-13 Itoh Oil Mfg Branched alcohol ester and cosmetics compounded therewith
JPS6019736B2 (en) * 1977-12-20 1985-05-17 伊藤製油株式会社 Branched alcohol ester and cosmetics containing it
WO2017130873A1 (en) * 2016-01-29 2017-08-03 日本ゼオン株式会社 Resist pattern forming method
WO2017130872A1 (en) * 2016-01-29 2017-08-03 日本ゼオン株式会社 Resist pattern forming method
JPWO2017130873A1 (en) * 2016-01-29 2018-11-22 日本ゼオン株式会社 Resist pattern forming method
JPWO2017130872A1 (en) * 2016-01-29 2018-11-22 日本ゼオン株式会社 Resist pattern forming method

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