JPS53135703A - Resist material for printing xxray lithographic plate - Google Patents
Resist material for printing xxray lithographic plateInfo
- Publication number
- JPS53135703A JPS53135703A JP4797378A JP4797378A JPS53135703A JP S53135703 A JPS53135703 A JP S53135703A JP 4797378 A JP4797378 A JP 4797378A JP 4797378 A JP4797378 A JP 4797378A JP S53135703 A JPS53135703 A JP S53135703A
- Authority
- JP
- Japan
- Prior art keywords
- xxray
- printing
- resist material
- lithographic plate
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1730877A GB1602724A (en) | 1977-04-26 | 1977-04-26 | Resist material for x-ray lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53135703A true JPS53135703A (en) | 1978-11-27 |
JPS5721698B2 JPS5721698B2 (en) | 1982-05-08 |
Family
ID=10092910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4797378A Granted JPS53135703A (en) | 1977-04-26 | 1978-04-24 | Resist material for printing xxray lithographic plate |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS53135703A (en) |
DE (1) | DE2817426A1 (en) |
FR (1) | FR2389156A1 (en) |
GB (1) | GB1602724A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2461967A2 (en) * | 1979-07-17 | 1981-02-06 | Thomson Csf | Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics |
EP0016679B1 (en) * | 1979-03-09 | 1982-06-09 | Thomson-Csf | Photomasking substances, process for preparing them and mask obtained |
FR2451050A1 (en) * | 1979-03-09 | 1980-10-03 | Thomson Csf | Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics |
DE3153069T1 (en) * | 1981-12-21 | 1983-12-15 | Institut chimii Akademii Nauk SSSR, Gor'kij | PHOTO AND ELECTRON RESIST |
JP2002110505A (en) * | 2000-09-27 | 2002-04-12 | Mitsubishi Electric Corp | Method and device of exposure, x-ray mask, resist, semiconductor and fine structure |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
JPS5376825A (en) * | 1976-12-20 | 1978-07-07 | Cho Lsi Gijutsu Kenkyu Kumiai | Radiation sensitive positive regist material |
JPS53100774A (en) * | 1977-02-15 | 1978-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Resist composition for short eavelength ultraviolet light |
JPS53102025A (en) * | 1977-02-18 | 1978-09-06 | Hitachi Ltd | Radiation sensitive organic high molecular material |
JPS53116831A (en) * | 1977-03-23 | 1978-10-12 | Toshiba Corp | Radioactive-ray sensitive material |
-
1977
- 1977-04-26 GB GB1730877A patent/GB1602724A/en not_active Expired
-
1978
- 1978-04-21 DE DE19782817426 patent/DE2817426A1/en not_active Withdrawn
- 1978-04-24 JP JP4797378A patent/JPS53135703A/en active Granted
- 1978-04-26 FR FR7812272A patent/FR2389156A1/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
JPS5376825A (en) * | 1976-12-20 | 1978-07-07 | Cho Lsi Gijutsu Kenkyu Kumiai | Radiation sensitive positive regist material |
JPS53100774A (en) * | 1977-02-15 | 1978-09-02 | Nippon Telegr & Teleph Corp <Ntt> | Resist composition for short eavelength ultraviolet light |
JPS53102025A (en) * | 1977-02-18 | 1978-09-06 | Hitachi Ltd | Radiation sensitive organic high molecular material |
JPS53116831A (en) * | 1977-03-23 | 1978-10-12 | Toshiba Corp | Radioactive-ray sensitive material |
Also Published As
Publication number | Publication date |
---|---|
JPS5721698B2 (en) | 1982-05-08 |
GB1602724A (en) | 1981-11-18 |
FR2389156A1 (en) | 1978-11-24 |
FR2389156B1 (en) | 1983-08-26 |
DE2817426A1 (en) | 1978-11-02 |
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