FR2451050A1 - Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics - Google Patents

Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics

Info

Publication number
FR2451050A1
FR2451050A1 FR7906136A FR7906136A FR2451050A1 FR 2451050 A1 FR2451050 A1 FR 2451050A1 FR 7906136 A FR7906136 A FR 7906136A FR 7906136 A FR7906136 A FR 7906136A FR 2451050 A1 FR2451050 A1 FR 2451050A1
Authority
FR
France
Prior art keywords
prodn
optics
integrated circuits
compsn
polymers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7906136A
Other languages
French (fr)
Other versions
FR2451050B1 (en
Inventor
Armand Eranian
Jean-Claude Dubois
Andre Couttet
Evelyne Datamanti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7906136A priority Critical patent/FR2451050A1/en
Priority to EP80400300A priority patent/EP0016679B1/en
Priority to DE8080400300T priority patent/DE3060510D1/en
Priority to US06/127,745 priority patent/US4268590A/en
Priority to JP2901280A priority patent/JPS55133038A/en
Publication of FR2451050A1 publication Critical patent/FR2451050A1/en
Application granted granted Critical
Publication of FR2451050B1 publication Critical patent/FR2451050B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Abstract

Photomask compsn. decomposing when irradiated comprises copolymers of the alpha-alkylacrylic series substd. by >=2 halogen atoms and of formula where the R's are 1-10C alkyl substd. by F, Cl or Br, the indices a, a', b, b', c and c' being integers and are 0 or positive; m, n and p are 0 or positive integers, only one of m, n and p being 0. The compsn. is used as a positive photoresist and is degradable by electrons, UV (200-300 nm), X-rays (4-50 Angstroms) and gamma-rays. The compsn. exhibits high resolution and is used for the prodn. of integrated circuits and optics.
FR7906136A 1979-03-09 1979-03-09 Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics Granted FR2451050A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR7906136A FR2451050A1 (en) 1979-03-09 1979-03-09 Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics
EP80400300A EP0016679B1 (en) 1979-03-09 1980-03-04 Photomasking substances, process for preparing them and mask obtained
DE8080400300T DE3060510D1 (en) 1979-03-09 1980-03-04 Photomasking substances, process for preparing them and mask obtained
US06/127,745 US4268590A (en) 1979-03-09 1980-03-06 Photomasking composition, process for preparing same and mask obtained
JP2901280A JPS55133038A (en) 1979-03-09 1980-03-07 Photomask composition* preparing same* and mask provided from same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7906136A FR2451050A1 (en) 1979-03-09 1979-03-09 Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics

Publications (2)

Publication Number Publication Date
FR2451050A1 true FR2451050A1 (en) 1980-10-03
FR2451050B1 FR2451050B1 (en) 1982-04-23

Family

ID=9222979

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7906136A Granted FR2451050A1 (en) 1979-03-09 1979-03-09 Positive photoresist compsn. - comprises halogen substituted alkyl acrylic! polymers, for prodn. of integrated circuits and optics

Country Status (2)

Country Link
JP (1) JPS55133038A (en)
FR (1) FR2451050A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117244A (en) * 1983-11-30 1985-06-24 Fujitsu Ltd Formation of pattern

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB780218A (en) * 1954-04-23 1957-07-31 Du Pont Photographic process for preparing intaglio and relief images
FR2299665A1 (en) * 1975-01-29 1976-08-27 Ibm IMAGE FORMING PROCESS USING A LACQUER BASED ON METHACRYLATE POLYMERS
FR2339184A1 (en) * 1976-01-23 1977-08-19 Nippon Telegraph & Telephone POLYMER COMPOSITION FOR PHOTORESISTS MASKS
US4061829A (en) * 1976-04-26 1977-12-06 Bell Telephone Laboratories, Incorporated Negative resist for X-ray and electron beam lithography and method of using same
DE2743763A1 (en) * 1976-10-04 1978-04-06 Ibm POSITIVE PAINT MATERIAL AND METHOD OF MANUFACTURING A PAINT MASK
FR2389156A1 (en) * 1977-04-26 1978-11-24 Int Standard Electric Corp X-RAY SENSITIVE SUBSTANCE FOR PHOTOGRAVURE

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB780218A (en) * 1954-04-23 1957-07-31 Du Pont Photographic process for preparing intaglio and relief images
FR2299665A1 (en) * 1975-01-29 1976-08-27 Ibm IMAGE FORMING PROCESS USING A LACQUER BASED ON METHACRYLATE POLYMERS
FR2339184A1 (en) * 1976-01-23 1977-08-19 Nippon Telegraph & Telephone POLYMER COMPOSITION FOR PHOTORESISTS MASKS
US4061829A (en) * 1976-04-26 1977-12-06 Bell Telephone Laboratories, Incorporated Negative resist for X-ray and electron beam lithography and method of using same
DE2743763A1 (en) * 1976-10-04 1978-04-06 Ibm POSITIVE PAINT MATERIAL AND METHOD OF MANUFACTURING A PAINT MASK
FR2389156A1 (en) * 1977-04-26 1978-11-24 Int Standard Electric Corp X-RAY SENSITIVE SUBSTANCE FOR PHOTOGRAVURE

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/77 *

Also Published As

Publication number Publication date
JPS637377B2 (en) 1988-02-16
JPS55133038A (en) 1980-10-16
FR2451050B1 (en) 1982-04-23

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