JPS54161320A - Production of cross linking type resist - Google Patents

Production of cross linking type resist

Info

Publication number
JPS54161320A
JPS54161320A JP6987678A JP6987678A JPS54161320A JP S54161320 A JPS54161320 A JP S54161320A JP 6987678 A JP6987678 A JP 6987678A JP 6987678 A JP6987678 A JP 6987678A JP S54161320 A JPS54161320 A JP S54161320A
Authority
JP
Japan
Prior art keywords
methacrylate
radical
mole
cross linking
type resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6987678A
Other languages
Japanese (ja)
Other versions
JPS5653733B2 (en
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6987678A priority Critical patent/JPS54161320A/en
Publication of JPS54161320A publication Critical patent/JPS54161320A/en
Publication of JPS5653733B2 publication Critical patent/JPS5653733B2/ja
Granted legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE: To produce a cross linking type resist for ionized radioactive ray by mixing a preset binary methacrylate polymer with a tertiary polymer.
CONSTITUTION: Methacrylate ester such as methyl methacrylate or cyclohexyl methacrylate containig an alcyl radial of C1-6, a cycloalkyl radial of C6 or an alkyl radical of C7-8 is mixed with a binary copolymer I (preferably containing a liberated carboxyl radical in about 1 to 20 mole %) with methacrylate acid and a tertiary copolymer II of the aforementioned methacrylate ester, methacrylate acid or methacrylate salt (preferably containing about 1 to 20 mole % of liberated carboxyl radical and about 0.1 to 3 mole % of a radical of carbonate salt. The content of the radical of carbonate salt in the resultant mixture is preferred to be about 0.05 to 1.5 mole %, and the mole ratio of the liberated carboxyl radical to the radical of carbonate salt is preferred to be about 2:1 to 25:1.
COPYRIGHT: (C)1979,JPO&Japio
JP6987678A 1978-06-12 1978-06-12 Production of cross linking type resist Granted JPS54161320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6987678A JPS54161320A (en) 1978-06-12 1978-06-12 Production of cross linking type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6987678A JPS54161320A (en) 1978-06-12 1978-06-12 Production of cross linking type resist

Publications (2)

Publication Number Publication Date
JPS54161320A true JPS54161320A (en) 1979-12-20
JPS5653733B2 JPS5653733B2 (en) 1981-12-21

Family

ID=13415412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6987678A Granted JPS54161320A (en) 1978-06-12 1978-06-12 Production of cross linking type resist

Country Status (1)

Country Link
JP (1) JPS54161320A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59178324U (en) * 1983-05-13 1984-11-29 株式会社　フエニツクス hat with pocket

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103632A (en) * 1972-12-21 1974-10-01 Philips Nv
US3981985A (en) * 1972-12-21 1976-09-21 U.S. Philips Corporation Positive-working electron resists
JPS5466776A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Fine pattern forming method
JPS5466829A (en) * 1977-11-07 1979-05-29 Fujitsu Ltd Pattern formation materil

Also Published As

Publication number Publication date
JPS5653733B2 (en) 1981-12-21

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